Advanced oxidation of 4-chlorobenzaldehyde in water by UV-light, ozonation and combination of both methods

Balcioglu, I. A.; Getoff, N.

doi:10.1016/s0045-6535(97)10084-4

Cited by 19 publications

(7 citation statements)

References 16 publications

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“…Basically all of the substrates revealed the same pool of products. The formation of the aliphatic carboxylic acids through ring opening such as formic acid, oxalic acid and muconic acid and benzoic acid were also reported previously for 4-ClBzA [8]. This fact strongly indicates that the photoinduced degradation of 2-ClBzA, 3-ClBzA and 4-ClBzA in the presence of air is a rather complicated process.…”

Section: Photodegradation Productssupporting

confidence: 73%

“…The presence of 4-hydroxybenzaldehyde and 4-chlorophenol were verified lasting up to 3 hours of irradiation time. In all of the cases, a variety of products with shorter retention times were also detected and the formation of the lower molecular weight carboxylic acids was explained [8].…”

Section: Hco CLmentioning

confidence: 95%

“…Also, the formation of the major products (Cl − ions, formaldehyde, and organic acids) were reported. In a comparative study on the oxidative degradation of 4-chlorobenzaldehyde, photolysis at (λ = 253.7 nm, ozonation and combination of both methods was performed [8]. The concentration of 4-chlorobenzaldehyde and ozone in the neutral, aqueous solution was varied.…”

Section: Introductionmentioning

confidence: 99%

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Degradation of chlorinated benzaldehydes in aqueous solutions by UV‐irradiation

Bekbölet

Getoff

2002

International Journal of Photoenergy

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Abstract. Photoinduced degradation of chlorinated benzaldehydes was investigated using UV light with λ = 253.7 nm in aerated aqueous solutions. Substrate degradation rate as expressed by first order reaction kinetics revealed rate constants, k; 7.45 × 10 −3 min −1 , 3.90 × 10 −3 min −1 and 3.11 × 10 −2 min −1 for 2-chlorobenzaldehyde, 3-chlorobenzaldehyde and 4-chlorobenzaldehyde respectively. The decomposition of the substrates was related to the formation of chloride and formaldehyde by homolytic cleavage processes. initial quantum yields and photochemical "G PH i -values" are reported for the degradation of the substrates. Based on the qualitative HPLC analysis, a probable reaction mechanism for the photoinduced degradation of chlorinated benzaldehydes is also presented.

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Section: Photodegradation Productssupporting

confidence: 73%

Section: Hco CLmentioning

confidence: 95%

Section: Introductionmentioning

confidence: 99%

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Degradation of chlorinated benzaldehydes in aqueous solutions by UV‐irradiation

Bekbölet

Getoff

2002

International Journal of Photoenergy

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“…Moreover, the UV radiation in the ozonation of 2-NS also improves the removal of TOC. The OH • induced by the presence of UV radiation proceeds with higher η TOC via the reaction noted as reaction V [12,13]. Limiting values of η TOC seem to appear for the sole ozonation of intermediates.…”

Section: Decomposition Of 2-ns During Ozonation With Uv Radiationmentioning

confidence: 96%

Decomposition of 2-naphthalenesulfonate in electroplating solution by ozonation with UV radiation

Chen

Chang

Huang

et al. 2005

Journal of Hazardous Materials

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“…Many researches have shown that an AOP is good at removing the organic compounds from water. The influence parameters include the pH, inorganic matters in water (Hoigné & Bader 1985;Boncz et al 2005), UV light exposure (Balcioglu & Getoff 1998;Legube & Leitner 1999), and catalyst use (Gracia et al 2000;Kasprzyk-Hordern et al 2003;Beltrá n et al 2004;Ernst et al 2004). …”

Section: Introductionmentioning

confidence: 99%

Treatment of local scrubber wastewater for semiconductor by using photo-catalytic ozonation

Chou

Huang

Shang

et al. 2009

Water Science and Technology

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This study investigates the oxidation of local scrubber wastewater (LSW) from semiconductor manufacture by using ozonation, catalytic ozonation (ozone/Al(2)O(3) and ozone/TiO(2)-Al(2)O(3)), and photo-catalytic ozonation (UV/TiO(2)-Al(2)O(3), ozone/UV and ozone/UV/TiO(2)-Al(2)O(3)). The results show that catalyst Al(2)O(3) and TiO(2)-Al(2)O(3) promotes the TOC removal under the condition of neutral or alkaline buffer solution during catalytic ozonation of LSW. The Al(2)O(3) induces highest promotion in TOC removal efficiency, which is higher than ozone alone by 26% TOC removal under alkaline buffer solution. However, TiO(2)-Al(2)O(3) and Al(2)O(3) cannot display the promotion in TOC removal under acidic condition. In addition, a pre-treatment of anion ion-exchange is employed and the result indicates that decreasing the anion ions concentration before AOPs can imply higher TOC removal during AOPs of LSW. In this study, ozone/UV under raw LSW acidic condition and ozone/Al(2)O(3) under alkaline buffer solution present 95% and 88% TOC removal rate respectively and show the higher TOC removal efficiency than other AOPs. Therefore, these two kinds of AOP can serve as the very viable AOP methods in the LSW reclamation for semiconductor.

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Advanced oxidation of 4-chlorobenzaldehyde in water by UV-light, ozonation and combination of both methods

Cited by 19 publications

References 16 publications

Degradation of chlorinated benzaldehydes in aqueous solutions by UV‐irradiation

Degradation of chlorinated benzaldehydes in aqueous solutions by UV‐irradiation

Decomposition of 2-naphthalenesulfonate in electroplating solution by ozonation with UV radiation

Treatment of local scrubber wastewater for semiconductor by using photo-catalytic ozonation

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