Advanced secondary ion mass spectroscopy quantification in the first few nanometer of B, P, and As ultrashallow implants

Merkulov, A.; Peres, P.; Choi, Si Kying; Horréard, F.; Ehrke, H.-U.; Loibl, N.; Schuhmacher, M.

doi:10.1116/1.3225588

Cited by 18 publications

(10 citation statements)

References 2 publications

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“…These discrepancies suggest that there is an inherent difficulty in determining these and/or the presence of an uncontrolled experimental parameter influencing the results. One indication for the latter comes from the observation of Merkulov4, 5 that small amounts of oxygen quite strongly influence the negative ion emission probability. Knowing that the impact of Cs on the ionization probability is closely linked to the amount of Cs at the surface, his observations could be interpreted as a change in the Cs concentration with oxygen partial pressure.…”

Section: Introductionmentioning

confidence: 99%

2‐(2′‐Pyridyl)‐4,6‐diphenylphosphinine versus 2‐(2′‐Pyridyl)‐4,6‐diphenylpyridine: Synthesis, Characterization, and Reactivity of Cationic Rh^III and Ir^III Complexes Based on Aromatic Phosphorus Heterocycles

Krom¹,

Broeckx²,

Lutz

et al. 2013

Chemistry A European J

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The bidentate P,N hybrid ligand 1 allows access for the first time to novel cationic phosphinine-based Rh(III) and Ir(III) complexes, broadening significantly the scope of low-coordinate aromatic phosphorus heterocycles for potential applications. The coordination chemistry of 1 towards Rh(III) and Ir(III) was investigated and compared with the analogous 2,2'-bipyridine derivative, 2-(2'-pyridyl)-4,6-diphenylpyridine (2), which showed significant differences. The molecular structures of [RhCl(Cp*)(1)]Cl and [IrCl(Cp*)(1)]Cl (Cp*=pentamethylcyclopentadienyl) were determined by means of X-ray diffraction and confirm the mononuclear nature of the λ(3) -phosphinine-Rh(III) and Ir(III) complexes. In contrast, a different reactivity and coordination behavior was found for the nitrogen analogue 2, especially towards Rh(III) as a bimetallic ion pair [RhCl(Cp*)(2)](+) [RhCl3 (Cp*)](-) is formed rather than a mononuclear coordination compound. [RhCl(Cp*)(1)]Cl and [IrCl(Cp*)(1)]Cl react with water regio- and diastereoselectively at the external PC double bond, leading exclusively to the anti-addition products [MCl(Cp*)(1H⋅OH)]Cl as confirmed by X-ray crystal-structure determination.

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Section: Introductionmentioning

confidence: 99%

2‐(2′‐Pyridyl)‐4,6‐diphenylphosphinine versus 2‐(2′‐Pyridyl)‐4,6‐diphenylpyridine: Synthesis, Characterization, and Reactivity of Cationic Rh^III and Ir^III Complexes Based on Aromatic Phosphorus Heterocycles

Krom¹,

Broeckx²,

Lutz

et al. 2013

Chemistry A European J

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“…Since 2010, a high-brightness radio-frequency (RF) plasma gas source, developed by Oregon Physics LCC, has been available on SC Ultra intruments for O 2 1 primary ions. 7 Compared to a conventional duoplasmatron, the RF plasma source enables substantially higher beam densities (by approximately a factor 10). In parallel, an RF source for O À ions that could be fitted on a NanoSIMS is currently tested at CAMECA.…”

Section: The Duoplasmatron Sourcementioning

confidence: 99%

Secondary Ion Mass Spectrometry

Sangely

Boyer

Chambost

et al. 2014

Sector Field Mass Spectrometry for Elemental and Isotopic Analysis

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i Commissariat à l'énergie atomique et aux énergies alternatives, DEN Cadarache, France; j Commissariat à l'énergie atomique et aux énergies alternatives,The basic principle of SIMS is that a focused beam of energetic ions (so-called primary ions) is targeted onto the surface of a solid sample. Primary ions dissipate their energy, leading to the sputtering and ionisation of the outmost atoms of the sample surface. The resulting secondary ions are accelerated and transferred to a magnetic analyser.

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“…Considering especially the continuous shrinkage of junction depth in devices, conventional ion beam sputtering can reach the limitation. [3] Therefore, the development of the cluster ion beam technology has been regarded as the current task to overcome these limitations.…”

Section: Introductionmentioning

confidence: 99%

Damage profiles of Si (001) surface via Ar cluster beam sputtering

Kyoung

Lee

Chung

et al. 2012

Surface & Interface Analysis

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Damage profiles on Si (001) surface via argon gas cluster ion beam sputtering and mono-atomic argon ion beam sputtering were investigated using medium energy ion scattering. The surface thickness damaged by Ar cluster ion beam sputtering was approximately 10 nm for 20 keV, 6.4 nm for 10 keV, and 4.2 nm for 5 keV and the composition of the implanted Ar atoms was 0.2 at% for 20 keV and 0.1 at% for both 10 and 5 keV. The surface thickness damaged by Ar ion beam sputtering was approximately 5.3 nm for 1 keV, 8.5 nm for 2 keV, and 12 nm for 3 keV and the maximum Ar concentration of the implanted Ar atoms in the Si substrate was 5.5 at% for 1 keV, 5.8 at% for 2 keV, and 7.8 at% for 3 keV. The depth of the damaged layers after Ar ion sputtering on Si (001) is proportional to the in-depth distribution of the implanted primary Ar ions. The depth of the damaged layer after the Ar cluster ion beam sputtering did not depend on the implanted Ar atoms because the implanted Ar atoms are negligible. Understanding the details about the damage process via Ar cluster ion beam sputtering can be useful for the practical surface analysis.

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Advanced secondary ion mass spectroscopy quantification in the first few nanometer of B, P, and As ultrashallow implants

Cited by 18 publications

References 2 publications

2‐(2′‐Pyridyl)‐4,6‐diphenylphosphinine versus 2‐(2′‐Pyridyl)‐4,6‐diphenylpyridine: Synthesis, Characterization, and Reactivity of Cationic Rh^III and Ir^III Complexes Based on Aromatic Phosphorus Heterocycles

2‐(2′‐Pyridyl)‐4,6‐diphenylphosphinine versus 2‐(2′‐Pyridyl)‐4,6‐diphenylpyridine: Synthesis, Characterization, and Reactivity of Cationic Rh^III and Ir^III Complexes Based on Aromatic Phosphorus Heterocycles

Secondary Ion Mass Spectrometry

Damage profiles of Si (001) surface via Ar cluster beam sputtering

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Advanced secondary ion mass spectroscopy quantification in the first few nanometer of B, P, and As ultrashallow implants

Cited by 18 publications

References 2 publications

2‐(2′‐Pyridyl)‐4,6‐diphenylphosphinine versus 2‐(2′‐Pyridyl)‐4,6‐diphenylpyridine: Synthesis, Characterization, and Reactivity of Cationic RhIII and IrIII Complexes Based on Aromatic Phosphorus Heterocycles

2‐(2′‐Pyridyl)‐4,6‐diphenylphosphinine versus 2‐(2′‐Pyridyl)‐4,6‐diphenylpyridine: Synthesis, Characterization, and Reactivity of Cationic RhIII and IrIII Complexes Based on Aromatic Phosphorus Heterocycles

Secondary Ion Mass Spectrometry

Damage profiles of Si (001) surface via Ar cluster beam sputtering

Contact Info

Product

Resources

About

2‐(2′‐Pyridyl)‐4,6‐diphenylphosphinine versus 2‐(2′‐Pyridyl)‐4,6‐diphenylpyridine: Synthesis, Characterization, and Reactivity of Cationic Rh^III and Ir^III Complexes Based on Aromatic Phosphorus Heterocycles

2‐(2′‐Pyridyl)‐4,6‐diphenylphosphinine versus 2‐(2′‐Pyridyl)‐4,6‐diphenylpyridine: Synthesis, Characterization, and Reactivity of Cationic Rh^III and Ir^III Complexes Based on Aromatic Phosphorus Heterocycles