Advanced tape-exfoliated method for preparing large-area 2D monolayers: a review

Abstract

The tape exfoliation method is still the easiest and most convenient way to obtain large-area two-dimensional (2D) monolayers in experimental research. Recently, there are some important advances in tape exfoliation method for large 2D monolayer materials. This review mainly introduced three kinds of new tape exfoliation methods including modified Scotch tape exfoliation method, metal-assisted tape exfoliation method and gel-assisted tape exfoliation method. We highlight the operation process and exfoliated mechanism of each method. We point out several problems to be solved and give an outlook on the development direction of the new tape exfoliation method. We hope this review will help researchers, especially for beginners, quickly and easily obtain a variety of 2D monolayers for their own experiments.

Electrode Engineering in MoS2 MOSFET: Different Semiconductor/Metal Interfaces

“…Figure 1a illustrates a schematic of the MoS 2 MOSFET with few-layer MoS 2 by mechanical exfoliation covered on SiO 2 (300 nm), [29] and the source-drain Ag electrodes is prepared by electron beam lithography (EBL) and thermal evaporation. Its optical image is shown in Figure S1a (Supporting Information).…”

Schottky-Contacted WSe2 Hot-Electron Photodetectors with Fast Response and High Sensitivity

“…First, Cr/Au (15 nm/50 nm) electrodes are defined on a silicon substrate (with 300 nm SiO 2 ) by photolithography, and then metal evaporation and lift-off processes are introduced. WSe 2 flakes are obtained by mechanical exfoliation with Scotch tape and then transferred onto the Au electrode to form ideal Schottky contact without the pinning effect . Subsequently, a 5 nm Al 2 O 3 tunneling layer is grown by atomic layer deposition.…”

Engineering van der Waals Materials for Advanced Metaphotonics

“…Alternatively, an improved direct strategy toward synthesizing monolayer 2D sheets in high-yield and large-area, the ion-intercalation and exfoliation method, was developed. − However, this method is sensitive to water and oxygen, and the resulting sheets may have some defects and relatively small lateral size. With the remarkable efforts of researchers, advanced tape exfoliation fabrication methods including modified Scotch tape exfoliation, metal-assisted tape exfoliation, , and gel-assisted tape exfoliation, − have been developed to fabricate high-yield and large-area monolayer 2D materials. For instance, Moon et al successfully fabricated natural monolayer graphene with average area over 150 000 μm 2 via advanced metal-assisted tape exfoliation using a 60 nm thick Pd metal film .…”