Advanced TXRF Analysis: Background Reduction when Measuring High-k Materials and Mapping Metallic Contamination

Trace metal analysis on hafnium silicate deposited Si wafer by Total Reflection X-ray Fluorescence

“…In this paper, an Ir-Lα X-ray source is applied to surface contamination analysis on hafnium silicate. The energy of Ir-Lα1, 9.18 keV, is slightly lower than conventional W-Lβ1 (9.77 keV) radiation, which does not cause Hf-L absorption (9.56 keV in Hf-LIII) and the corresponding emissions [4,5]. The spectral characteristics were investigated by intentional contamination with several transition metals on hafnium silicate film.…”