Trace metal analysis on hafnium silicate deposited Si wafer by Total Reflection X-ray Fluorescence

Takahara, Hikari; Murakami, Hiroyuki; Kinashi, Toru; Sparks, Chris

doi:10.1016/j.sab.2008.10.002

Cited by 6 publications

(2 citation statements)

References 10 publications

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“…Sitko et al (65) developed an ED-XRF spectrometer for standardless analysis of samples of various sizes. In the constructed spectrometer, the radiation from the Ag target X-ray tube excites the secondary target and the characteristic radiation of the second target, which is monochromatized using a LiF (200) crystal, excites elements in the analyzed sample. The X-ray spectra are collected by a thermoelectrically cooled Si-PIN detector.…”

Section: Quantification and Fundamental Datamentioning

confidence: 99%

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X-ray Spectrometry

et al. 2010

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Section: Quantification and Fundamental Datamentioning

confidence: 99%

“…Another application of TXRF to trace metal analysis was suggested by Takahara et al (200). Hafnium silicate, which is a high-k material, is a key material in the semiconductor field.…”

Section: Applicationsmentioning

confidence: 99%