In this work, degenerate n-type GaN thin films prepared by co-sputtering from a liquid Ga-target were demonstrated and their low field scattering mechanisms described. Extremely high donor concentrations above 3×1020 cm-3 at low process temperatures (< 800 °C) with specific resistivities below 0.5 mΩcm were achieved. The degenerate nature of the sputtered films was verified via temperature-dependent Hall-measurements 
(300-550 K) revealing negligible change in electron mobility and donor concentration. Scattering at ionized impurities was determined to be the major limiting factor with a minor contribution of polar optical-phonon scattering at high temperatures.