Aerial image sensor: in-situ scanner aberration monitor

Tyminski, Jacek K.; Hagiwara, Tsuneyuki; Kondo, Naoto; Ishiguro, Hiroshi

doi:10.1117/12.656651

Cited by 11 publications

(9 citation statements)

References 5 publications

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“…This fact reflects the object amplitude assumption in Eq. (5). Hence, if we focus on the local peak on the right-hand side (x > 0) of the image, a corresponding local peak exists on the left-hand side (x < 0).…”

Section: Research Articlementioning

confidence: 95%

“…Moreover, we cannot apply interferometer measurements to the "lens-onbody" situation in which the projection optics have already been installed in the exposure apparatus. On the other hand, alternative methods based on images projected by the optical system, which are called aerial images in this work, have been actively suggested [2][3][4][5][6][7][8][9][10][11][12] and could be utilized in lens-on-body aberration measurements at the cost of the measurement accuracy.…”

Section: Introductionmentioning

confidence: 99%

“…For example, the odd aberration leads to a lateral shift of the total aerial image, and the even aberration shifts the best focus position in the z axis. Therefore, the wavefront aberration can be estimated by measuring the qualities of these aberration-induced characteristics [2][3][4][5][6][7][8]. However, in the measurement of the best focus shift, we must obtain at least three defocused images at different z-axis positions.…”

Section: Introductionmentioning

confidence: 99%

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Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography

Yashiki¹

2015

Appl. Opt.

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The theory of full wavefront aberration measurements is developed using the intensity differences of aerial images, which are the projected images of one-dimensional measurement patterns consisting of single- or multibars. The key concept is the parity decomposition about the optical axis for two optical components: illumination pupil and wavefront aberration. An additional mathematical treatment, which is a perturbative approach with regard to aberration, is applied to the partially coherent imaging formula. The intensity difference of the two peaks has terms that are linear to the odd and even aberration with rigorously canceled squared aberration terms. The full wavefront aberration measurement is realized from simultaneous linear equations about the intensity difference. The validity of this approach is numerically confirmed under practical lithography conditions.

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Section: Research Articlementioning

confidence: 95%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography

Yashiki¹

2015

Appl. Opt.

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“…Published by sensor (TIS) at multiple illumination settings) [6,7], and Nikon's Z37 AIS (Aerial Image Sensor) [8,9], aberration ring test [10,11] and phase wheel method [12].…”

Section: Osamentioning

confidence: 99%

Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image

et al. 2010

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This paper proposes an in-situ technique for measuring even aberration of lithographic projection optics. By using Hopkins theory of partial coherent imaging and thick-mask model, the linear relationship between intensity difference of adjacent peaks in alternating phase shifting mask (Alt-PSM) image and even aberration is established by equations and verified by numerical results. The sensitivity of measuring even aberration of lithographic projection optics based on this linear relationship is analyzed, and the measurement mark is designed accordingly. The measurement performance of the present technique is evaluated using lithographic OSA Published bysimulator PROLITH, which shows the present technique is capable of measuring even aberration of lithographic projection optics with ultrahigh measurement accuracy.

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“…In-situ measurement of wavefront aberration has been a critical subject for more than 10 years, and several techniques have been reported to characterize projection lens aberrations. [6][7][8] One of the recent examples, Z37 AIS, an aerial image-based technique proposed by Hagiwara, 9 Tyminski, 10 and later extended by Liu,11 uses 36 gratings with 6 orientations to measure Zernike aberration up to Z 37 , and the gratings have six pitches for each orientation.…”

Section: Introductionmentioning

confidence: 99%

Practical application of aerial image by principal component analysis to measure wavefront aberration of lithographic lens

Duan

Wang

Yan

et al. 2012

J. Micro/Nanolith. MEMS MOEMS

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Abstract. In this paper, we propose a new method that can extract aberrations using aerial image measurements and present its experimental results on lithographic tools. Based on physical simulation and statistical analysis, a linear regression matrix is obtained establishing a connection between principal component coefficients of specific aerial images and Zernike coefficients. In the application phase, the aberrations of the projection lens are solved via the use of this regression matrix. An engineering model is established based on an extension of theoretical model that incorporates all the significant systematic errors. The performance of the engineering model as applied on a 0.75 NA ArF scanner is reported. In the experiment, measurement marks oriented in orthogonal directions are used and aerial images at 9 field points are measured. To verify the repeatability of this technique, every point is measured 20 times. By inputting the aerial images into the engineering model, Zernike coefficients are solved and the results are analyzed. The wafer exposures were performed to evaluate the results of aberration correction.

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Aerial image sensor: in-situ scanner aberration monitor

Cited by 11 publications

References 5 publications

Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography

Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography

Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image

Practical application of aerial image by principal component analysis to measure wavefront aberration of lithographic lens

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