2014
DOI: 10.1117/12.2068308
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AIMS EUV first light imaging performance

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“…As a result, bright and dark areas in the DUV and EUV images directly correspond to the ML and absorber parts. 1,27 On the other hand, in the EB inspection system, the secondary electron emission coefficient (SEEC) determines the material contrast on the SE image. 9,19,21,23 The SEEC of the absorber is larger than that of the ML.…”
Section: Comparison Of Defect Detectability Betweenmentioning
confidence: 99%
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“…As a result, bright and dark areas in the DUV and EUV images directly correspond to the ML and absorber parts. 1,27 On the other hand, in the EB inspection system, the secondary electron emission coefficient (SEEC) determines the material contrast on the SE image. 9,19,21,23 The SEEC of the absorber is larger than that of the ML.…”
Section: Comparison Of Defect Detectability Betweenmentioning
confidence: 99%
“…2. 9,19,21,23,27 The defect image contrast is also influenced by the defect size and shape. In the cases of pinhole and intrusion defects, as the defects become smaller, the signals from the ML become lower in both cases of DUV and EB images.…”
Section: Comparison Of Defect Detectability Betweenmentioning
confidence: 99%