ALD NiO Thin Films As a Hole Transport-Electron Blocking Layer Material for Photo-Detector and Solar Cell Devices

Abstract

ALD NiO was deposited on silicon and glass substrates by applying alternative pulses of Ni(amd) (AccuDEP TM Ni, Dow Chemical), and water. The film deposition rate at 200°C was 0.25-0.45 Å/cycle. The material properties of the NiO films were characterized using FESEM, AFM, UV-Vis-NIR spectrometer, and GIXRD. An ultrathin (~3-4 nm) film of the optimized ALD NiO was applied to very thin (500nm) CdTe cells in order to evaluate the potential of the ALD NiO film as a HT-EBL layer. The ALD NiO integrated CdTe cells enhanced Voc and FF, and offered 15% improvement in PCE compared with the control cells.

Review—On Atomic Layer Deposition: Current Progress and Future Challenges

“…The NiO has primarily used for catalytic applications including water oxidation, 172 CO oxidation, 173,174 toluene combustion, 175,176 and oxygen evolution. 177 Some other applications of NiO have been demonstrated for sensor, 178 solar cells, [179][180][181] and super capacitors. 182 Several precursors have been synthesized and employed for atomic layer deposition of NiO as summarised in Table IX.…”

A high-performance self-powered broadband photodetector based on a CH3NH3PbI3 perovskite/ZnO nanorod array heterostructure

“…Dr Shen developed a p-type ZnO/n-type ZnO homojunction structure with very good reliability. 14 A hole-transport layer (HTL) plays a critical role in a p-n junction, 15 as it enhances hole transport while blocks the backflow of electrons. PEDOT:DSS, spiro-OMETAD, and P3HT are commonly used HTL materials, while their strong acidity and hygroscopicity cause instability and they are harmful to the environment.…”

Optimising Aged Nanostructured Nickel Oxide Thin Films for Solar Cells Fabrication

“…Nickel oxide (NiO) holds great promise being a p-type metal oxide with a vast range of applications. [4][5][6] Several methods have been used to deposit NiO with a view to optimising it for various applications. The deposition methods are hydrothermal growth, laser ablation, sol-gel, sputtering and atomic layer deposition.…”