“…There have been a few inspection mechanisms proposed for wafer bumps: laser triangulation [5,13,14], confocal microscopy [4,6,7,10,12], and gray-level pattern projection [1,2,3,8,9,11]. However, laser triangulation is of low speed and low resolution, confocal microscopy involves moving parts and has limitation in its operation speed, and gray-level pattern projection has the problems of image brightness saturation and high sensitivity to noise.…”