Alkyl-benzotriazole derivatives as inhibitors of iron and copper corrosion

Trabanelli, G.; Frignani, A.; Monticelli, C.; Zucchi, F.

doi:10.17675/2305-6894-2015-4-1-096-107

Cited by 18 publications

(9 citation statements)

References 29 publications

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“…The latter is ensured in several chemical conditions and atmospheric environment by forming corrosion products with non conductive behavior or a barrier layer of oxides [9,10]. However, corrosion of copper is much more accelerated in some chemical specific environment especially those containing O 2 , sulfate, chloride and nitrates ions which are known as aggressive anions towards copper [11][12][13][14][15][16][17][18].…”

Section: Introductionmentioning

confidence: 99%

Inhibitive effect of 1,3,4-thiadiazole-2,5-dithiol on copper corrosion in chloride media

2019

Int. J. Corros. Scale Inhib.

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Corrosion inhibition of copper by 1,3,4-thiadiazole-2,5-dithiol (DMTD) was investigated in 0.1 M NaCl solution using electrochemical methods, surface and solution analysis. Polarization tests results showed that DMTD inhibits efficiently copper corrosion, prevents oxide formation and revealed a marked effect of mixed inhibition after 1 h and 24 h immersion. Electrochemical impedance spectroscopy (EIS) measurements corroborate these results and indicate that the value of polarization resistance increased with DTMD concentration for 1 h immersion time. Addition of 10-2 M DMTD in the test solution exhibited a maximum inhibitive efficiency of 97% up to 24 h immersion. Surface analysis techniques were conducted on copper specimens after 24 h immersion in 0.1 M NaCl solution. SEM/EDX results confirmed that DMTD forms an adsorbed protective layer on copper surface which was found to be hydrophobic as indicated by contact angle (CA) measurements. These results were further confirmed by XRD patterns which indicated the lack of crystallized corrosion products. Cland Cu 2+ ions concentrations in the solution, after 30 days immersion of copper sheet in 0.1 M NaCl solution with and without 10-2 M DMTD, were determined by ionic chromatography (IC) and conducted by Inductively Coupled Plasma-Atomic Emission Spectroscopy (ICP-AES) respectively. The results showed that without DMTD Clconcentration decreases, while Cu 2+ one increases due to corrosion process. In contrast, in the presence of 10-2 M DMTD chloride ions concentration remained practically unchanged (0.099 mol/L) and Cu 2+ concentration is quite low.

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Section: Introductionmentioning

confidence: 99%

Inhibitive effect of 1,3,4-thiadiazole-2,5-dithiol on copper corrosion in chloride media

2019

Int. J. Corros. Scale Inhib.

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“…Azoles and their derivatives are considered to be the most effective organic inhibitors against copper corrosion [8][9][10][11][12][13][14][15][16][17]. The inhibiting properties of azoles are provided by the presence of H atoms bound to the N atom in the azole cycle of the molecule, which makes azoles relatively strong acids capable of forming salts with metal ions.…”

Section: Introductionmentioning

confidence: 99%

“…As a consequence, these nitrogen-based heterocyclic compounds can be coordinated with Cu, Cu + or Cu 2+ via the lone electron pairs of their N atoms to form complexes with copper [18][19][20][21]. 1,2,3-Benzotriazole and its derivatives have been studied most deeply and used most widely, and their indisputable advantage is the ability to protect copper not only in neutral environments, including humid atmospheres, but also in solutions of corrosive acids [10][11][12][13][14]17]. Along with benzotriazole derivatives, more hydrophilic 1,2,4-triazole derivatives are also attractive, as they can act as effective corrosion inhibitors for copper in chloride environments because of the unique structural property of the triazole moiety [22,23].…”

Section: Introductionmentioning

confidence: 99%

Copper corrosion inhibition in chloride environments by 3-(N-hetaryl)-5-amino-1H-1,2,4-triazoles

Kozaderov¹,

Шихалиев²,

Chetti³

et al. 2019

Int. J. Corros. Scale Inhib.

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According to the results of experimental electrochemical measurements and corrosion tests, the effectiveness of inhibiting copper corrosion in chloride media by N-hetaryl derivatives of 5-amino-1H-1,2,4-triazole was evaluated. It was found that addition of any of the organic additives studied into a borate buffer solution in the presence of 10 mM NaCl leads to a significant ennoblement of the pitting potential of copper electrode. At the same time, the anodic and cathodic processes on copper in the presence of 3-(4-methylpiperazin-2-yl)-5amino-1H-1,2,4-triazole at a concentration of 0.1-1.0 mM generally proceed at a higher rate than in the absence of an organic additive. On the contrary, addition of 3-(piperidin-1-yl)-, 3-(4-phenylpiperazin-2-yl)-and 3-(4-benzylpiperazin-1-yl)-5-amino-1H-1,2,4-triazoles to the solution decreases the rate of both the cathodic process and anodic oxidation of copper, regardless of the nature of an inhibiting additive and its concentration. In addition, in the presence of these inhibitors, the current density of copper electrode passivation decreases markedly. All the compounds studied are characterized by moderate degrees of copper protection in neutral chloride media (at least 56%). The degree of protection against acid corrosion for all the inhibitors studied is 30-60% and increases with increasing concentration of an organic additive. The greatest protective effect is provided by 3-(piperidin-1-yl)-5amino-1H-1,2,4-triazole in neutral or acidic chloride solutions. None of the inhibitors proved to be highly effective against atmospheric corrosion of copper: the first corrosion damage appears within 40-60 hours. Using DFT simulations, a correlation was found between the inhibitory effect and the molecular structure of the 5-amino-1H-1,2,4-triazole derivatives studied.

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“…In attempts to simulate real application conditions, several studies were undertaken in a liquid acidic environment on copper single crystals [15][16][17]. Studies conducted at real conditions usually focus on bulk copper samples, the surface of which is considered, evaluating the influence of the pH in aqueous solution [9, 11, 26-27, 30, 38], synergistic effects due to the presence of other additives [30,39], static and flow conditions [29]. Nevertheless, the investigation of the interaction of benzotriazole with real or realistic copper surfaces is made more complex both because of the multiplicity of the possible interactions occurring within the system studied, and by the difficulty of performing surface science measurements under realistic conditions.…”

Section: Introductionmentioning

confidence: 99%

Effect of the pH in the growth of benzotriazole model layers at realistic environmental conditions

et al. 2018

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The growth of benzotriazole (BTAH) via solution deposition onto copper monolayers prepared via underpotential deposition (UPD) on Au(111)/mica substrates has been investigated using X-ray photoelectron spectroscopy (XPS) and ambient scanning tunnelling microscopy (STM) as a function of solution pH and immersion time. Adsorbed species have been found sensitive to the solution pH with a higher benzotriazole surface concentration following deposition from an acidic environment. Although the layers prepared at different pH are chemically different, as highlighted by XPS, similar morphologies are recorded via STM. These results are critically discussed in the light of some of the adsorption models previously reported.

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Alkyl-benzotriazole derivatives as inhibitors of iron and copper corrosion

Cited by 18 publications

References 29 publications

Inhibitive effect of 1,3,4-thiadiazole-2,5-dithiol on copper corrosion in chloride media

Inhibitive effect of 1,3,4-thiadiazole-2,5-dithiol on copper corrosion in chloride media

Copper corrosion inhibition in chloride environments by 3-(N-hetaryl)-5-amino-1H-1,2,4-triazoles

Effect of the pH in the growth of benzotriazole model layers at realistic environmental conditions

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