2019
DOI: 10.17675/2305-6894-2019-8-2-14
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Inhibitive effect of 1,3,4-thiadiazole-2,5-dithiol on copper corrosion in chloride media

Abstract: Corrosion inhibition of copper by 1,3,4-thiadiazole-2,5-dithiol (DMTD) was investigated in 0.1 M NaCl solution using electrochemical methods, surface and solution analysis. Polarization tests results showed that DMTD inhibits efficiently copper corrosion, prevents oxide formation and revealed a marked effect of mixed inhibition after 1 h and 24 h immersion. Electrochemical impedance spectroscopy (EIS) measurements corroborate these results and indicate that the value of polarization resistance increased with D… Show more

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Cited by 3 publications
(3 citation statements)
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“…Regarding the fact that a CPE is described as a parallel combination of a resistor and a pure capacitor, Q may be replaced by the values of capacitance calculated using Brug's formula described by Eqs. (8-9) [47][48][49]: The values of α dl ranged from 0.81 to 0.85 and the double-layer capacitances from 58 to 79 µF cm −2 . From impedance spectra recorded at 1000 rpm, the dependence of R ct and R d on potential is recapped in Table 2.…”
Section: Eis Measurements In the Cathodic Potential Rangementioning
confidence: 99%
“…Regarding the fact that a CPE is described as a parallel combination of a resistor and a pure capacitor, Q may be replaced by the values of capacitance calculated using Brug's formula described by Eqs. (8-9) [47][48][49]: The values of α dl ranged from 0.81 to 0.85 and the double-layer capacitances from 58 to 79 µF cm −2 . From impedance spectra recorded at 1000 rpm, the dependence of R ct and R d on potential is recapped in Table 2.…”
Section: Eis Measurements In the Cathodic Potential Rangementioning
confidence: 99%
“…Consequently of the surface's roughness and inhomogeneity, frequency dispersion causes suppressed semicircles (Echihi et al, 2019). Concurrently, when the concentration grows, the diameter of the Nyquist plots expands, signifying that copper is better shielded at greater concentrations (Lamaka et al, 2007).…”
Section: Eis Measurementsmentioning
confidence: 99%
“…The gradual substitution of H 2 O molecules is likely responsible for the increase in both R ct and the inhibition activity η% (Quartarone et al, 2008;Sherif et al, 2008) and hostile ions by adsorbing LFH molecules to a Cu surface, resulting in the formation of an adherent layer. Therefore, it is possible to infer that a reduction in double-layer thickness results from the produced film's increasing coverage of the copper substrate (Echihi et al, 2019;Tasić et al, 2018).…”
Section: Eis Measurementsmentioning
confidence: 99%