“…The non-uniformity of the MZI-WC on a wafer is one of the major bottlenecks in realizing low cost. In particular, the problem of non-uniformity in the MZI-WC with Y-branch often occurs due to difficulties in obtaining fine patterns at the y-junction using conventional photolithography, developing and reactive ion etching (RIE) [7,9]. Thus, multimode interference couplers (MMIs) are already widely incorporated in several PICs such as MZI-WCs, Michelson interferometer WCs and LD-gate switches for the realization of wavelength division multiplexing applications because of a stable splitting ratio, compact size, good fabrication tolerance, insensitivity to wavelength and polarization [13].…”