Allowable Substrate Bias for the Etching of n-GaN in Photo-Enhanced Electrochemical Etching

Seo, Jeong-Hyun; Oh, C. S.; Yang, J.; Yang, Gloria; Lim, Kee Young; Yoon, Chang Joo; Lee, H. J.

doi:10.1002/1521-396x(200111)188:1<403::aid-pssa403>3.3.co;2-w

phys. stat. sol. (a)

2001

DOI: 10.1002/1521-396x(200111)188:1<403::aid-pssa403>3.3.co;2-w

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Allowable Substrate Bias for the Etching of n-GaN in Photo-Enhanced Electrochemical Etching

Jeong-Hyun Seo

C. S. Oh

J. Yang

et al.

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Allowable Substrate Bias for the Etching of n-GaN in Photo-Enhanced Electrochemical Etching

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