2015
DOI: 10.1021/acsami.5b04287
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Alternative Spectral Photoresponse in a p-Cu2ZnSnS4/n-GaN Heterojunction Photodiode by Modulating Applied Voltage

Abstract: We report alternative visible and ultraviolet light response spectra in a p-Cu2ZnSnS4 (p-CZTS)/n-GaN heterojunction photodiode. A CZTS film was deposited on an n-GaN/sapphire substrate using a magnetron sputtering method. Current-voltage characteristic of the p-CZTS/n-GaN heterojunction photodiode showed a good rectifying behavior. The spectral response measurements indicate that the response wavelength of the photodiode can be tuned from ultraviolet to visible regions via applying zero and reverse bias. A ban… Show more

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Cited by 23 publications
(7 citation statements)
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“…Here, a 8 V reverse bias has not been found to have a detrimental irreversible junction breakdown effect as this result was reproducible when the photodetector was retested, which can be considered within the safe working range. This peak EQE value (in the order of 10 3 to 10 4% ) in the UV–vis region is much higher than those of previously reported CZTS photodetectors , and is comparable to those of other high quality photodetectors. We conclude that this impressive increase with applied bias is due to the widening of the depleted region. As a result, the additional photoelectrons generated in the bulk TiO 2 are more easily separated and collected.…”
Section: Resultssupporting
confidence: 68%
“…Here, a 8 V reverse bias has not been found to have a detrimental irreversible junction breakdown effect as this result was reproducible when the photodetector was retested, which can be considered within the safe working range. This peak EQE value (in the order of 10 3 to 10 4% ) in the UV–vis region is much higher than those of previously reported CZTS photodetectors , and is comparable to those of other high quality photodetectors. We conclude that this impressive increase with applied bias is due to the widening of the depleted region. As a result, the additional photoelectrons generated in the bulk TiO 2 are more easily separated and collected.…”
Section: Resultssupporting
confidence: 68%
“…Heterostructures of two dimensional layered materials and wide band gap semiconductors are of great importance for optoelectronic and nanoelectronic applications. [1][2][3][4][5][6][7] Among the wide band gap semiconductors, gallium nitride (GaN) is one of the most attractive nitride semiconductor for applications in light-emitting diodes (LEDs), solar cells, photodetectors, highelectron-mobility transistors, and high frequency power devices. [4,[6][7][8][9][10][11][12][13][14][15] Recently, significant interest has been given to fabricate graphene/GaN based Schottky junction considering the outstanding properties of both the materials.…”
Section: Introductionmentioning
confidence: 99%
“…Heterostructures of two dimensional layered materials and wide band gap semiconductors are of great importance for optoelectronic and nanoelectronic applications . Among the wide band gap semiconductors, gallium nitride (GaN) is one of the most attractive nitride semiconductor for applications in light‐emitting diodes (LEDs), solar cells, photodetectors, high‐electron‐mobility transistors, and high frequency power devices .…”
Section: Introductionmentioning
confidence: 99%
“…While heterointegration of Si with narrow band gap semiconductors has been conventionally performed via direct growth and wafer bonding methods, those methods have certain critical limitations. The direct growth method suffers from poor crystal quality and necessity for a thick buffer layer caused by lattice constant mismatch between Si and Ge or III–V semiconductors. The wafer bonding technique, which requires high pressure and temperature conditions, often results in generation of defects, such as voids and cracks, at heterostructure interfaces. , Interface defects result in poor electrical or optical performances of final devices because they act as charge trap sites. ,, …”
Section: Introductionmentioning
confidence: 99%
“…24,26 Interface defects result in poor electrical or optical performances of final devices because they act as charge trap sites. 25,27,28 Recently, the epitaxial layer transfer technique has been suggested as an alternative strategy for heterogeneous integration. 29 One of the important advantages of this technique is the absence of interfacial defects in heterostructures caused by lattice mismatch or high temperature processes.…”
Section: ■ Introductionmentioning
confidence: 99%