2009
DOI: 10.1016/j.jcat.2009.02.008
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Alternative synthesis of bulk and supported nickel phosphide from the thermal decomposition of hypophosphites

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Cited by 127 publications
(60 citation statements)
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“…This could be important for applications, as halides can poison the catalytic activity of nickel phosphides. 103 Evolution of Nickel Phosphides. Under the conditions studied (Scheme 1 above), the organophosphite precursors P(OMe) 3 , P(OEt) 3 , P(OnBu) 3 , P(OCH 2 tBu) 3 , P(OiPr) 3 , and P(OPh) 3 lead to nanocrystalline Ni 12 P 5 or Ni 2 P or both.…”
Section: ■ Introductionmentioning
confidence: 99%
“…This could be important for applications, as halides can poison the catalytic activity of nickel phosphides. 103 Evolution of Nickel Phosphides. Under the conditions studied (Scheme 1 above), the organophosphite precursors P(OMe) 3 , P(OEt) 3 , P(OnBu) 3 , P(OCH 2 tBu) 3 , P(OiPr) 3 , and P(OPh) 3 lead to nanocrystalline Ni 12 P 5 or Ni 2 P or both.…”
Section: ■ Introductionmentioning
confidence: 99%
“…Compared with metal, metal oxide and metal sulfide materials, metal phosphide ones have seldom been control-synthesized hitherto due to the lack of appropriate methods and the high activity of phosphorus. Up to now, metal phosphides have been successfully prepared by temperature-programmed reduction [16], solvothermal method [17], and thermal decomposition [18][19][20][21], etc. In this study, the precursor of FeS and sodium hypophosphite (NaH 2 PO 2 ÁH 2 O) were thermally treated at 350°C, and bulk and supported iron phosphide (FeP/SiO 2 ) samples were successfully synthesized.…”
Section: Introductionmentioning
confidence: 99%
“…Due to the harsh preparation conditions (elevated temperatures), extremely small particles of metal phosphides are still difficult to prepare. Choice of low-valence phosphorous precursors, such as phosphites 26) , hypophosphites 27), 28) , and pyrophosphates 29) could ameliorate the preparation conditions, allowing the formation of well-dispersed metal phosphides.…”
Section: Discussionmentioning
confidence: 99%