2018
DOI: 10.1039/c7tc04003b
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Aluminium/gallium, indium/gallium, and aluminium/indium co-doped ZnO thin films deposited via aerosol assisted CVD

Abstract: Aluminium/gallium co-doped ZnO (AGZO), indium/gallium co-doped ZnO (IGZO), and aluminium/indium co-doped ZnO (AIZO) thin films were synthesised on glass substrates via aerosol assisted chemical vapour deposition (AACVD).

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Cited by 84 publications
(36 citation statements)
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“…ZnO thin films are conventionally doped and co-doped with a number of proper dopants to improve their optical and electrical properties [12]. In principle, we investigate the optical and structural properties of sol-gel dip-synthesized group III (B, Al, Ga, and In)-doped ZnO thin films in this current work.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…ZnO thin films are conventionally doped and co-doped with a number of proper dopants to improve their optical and electrical properties [12]. In principle, we investigate the optical and structural properties of sol-gel dip-synthesized group III (B, Al, Ga, and In)-doped ZnO thin films in this current work.…”
Section: Introductionmentioning
confidence: 99%
“…In principle, we investigate the optical and structural properties of sol-gel dip-synthesized group III (B, Al, Ga, and In)-doped ZnO thin films in this current work. The structural, transport, and optical properties of B-doped ZnO, Al-doped ZnO, Ga-doped ZnO, and In-doped ZnO thin films are found to exhibit different properties than un-doped ZnO thin films [8,[12][13][14][15][16][17][18][19][20]. Deposition of undoped ZnO and group III (B, Al, Ga, and In)-doped ZnO thin films can be achieved by using techniques such chemical vapor deposition [2,21], magnetron sputtering [15,22], pulse laser deposition [23], electrochemical deposition [24], and the sol-gel method [14,25].…”
Section: Introductionmentioning
confidence: 99%
“…I Film synthesis AACVD depositions were performed as detailed in previous work. [17][18][19] Nitrogen (99.99%, BOC, Surrey, UK) was used as the carrier gas. All chemicals were obtained from Sigma Aldrich (Dorset, UK), and were used as purchased, without further purication.…”
Section: Methodsmentioning
confidence: 99%
“…In band gap engineering through doping of single or several impurities, the recombination probability of excited electrons and holes is very high near doping sites, which include deteriorative crystal defects such as lattice mismatch at the interface between the sensitizers and wide-band-gap semiconductors, unstable inherent disorders [20], and charge imbalance among dopants. Hence, even though the absorption of visible light is improved by doping, these recombination sites can cause significant loss of photocatalytic current during the separation and transfer of visible-light-excited electrons and holes.…”
Section: Introductionmentioning
confidence: 99%