&amp;lt;tex&amp;gt;$hboxCF _4$&amp;lt;/tex&amp;gt;Decomposition Using Inductively Coupled Plasma: Effect of Power Frequency

Kuroki, Tetsuo; Mine, Junko; Okubo, Masaaki; Yamamoto, Toshiaki; Saeki, Noboru

doi:10.1109/tia.2004.840948

Cited by 23 publications

(12 citation statements)

References 14 publications

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“…If in the first step reactions (1)-(6) have not occurred availability, there is not enough CF i produced. So there is no CO 2 and F produced in the later reactions (9)-(13), although more O radicals produced in reaction (8) with the increase of O 2 concentration. The result indicated that CF 4 decomposition highly depended on the electron collision as described in reactions (1)- (6).…”

Section: Effect Of O 2 Concentration On Dre Of Cfmentioning

confidence: 98%

“…Recently, the plasma technologies used in the abatement of perfluorocompounds include dielectric barrier discharges, inductively coupled plasma and microwave plasma [5][6][7][8][9][10][11][12][13][14][15]. Microwave plasma has high electron temperature and high electron density which is more efficient to perfluorocompounds abatement than other plasma technology.…”

Section: Introductionmentioning

confidence: 99%

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Abatement of perfluorocompounds with microwave plasma in atmospheric pressure environment

Xie

Sun

Zhu

2009

Journal of Hazardous Materials

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Section: Effect Of O 2 Concentration On Dre Of Cfmentioning

confidence: 98%

Section: Introductionmentioning

confidence: 99%

Abatement of perfluorocompounds with microwave plasma in atmospheric pressure environment

Xie

Sun

Zhu

2009

Journal of Hazardous Materials

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“…Recently, efforts have been made to abate the organic pollutants using either thermal or nonthermal plasma processes [1][2][3][4][5]. Thermal plasma processes such as DC arc, microwave discharge, and inductively coupled plasma are often used for treating high organic concentration streams, but not suitable for gas streams containing low concentrations of organic compounds because they necessarily consume a lot of electrical energy.…”

Section: Introductionmentioning

confidence: 99%

Abatement of Trichloromethane by Using Nonthermal Plasma Reactors

Mok

Lee

et al. 2008

Plasma Chem Plasma Process

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This work investigated the destruction of a halogenated carbon (trichloromethane) using different types of nonthermal plasma reactors. Three reactors, i.e., a surface discharge reactor, a dielectric-packed bed reactor and a barrier discharge reactor with a perforated dielectric tube, were compared with respected to the trichloromethane destruction efficiency. The effect of oxygen content and input power on the trichloromethane destruction was examined, and the byproducts were analyzed to elucidate the destruction pathways. The dielectric-packed bed reactor was found to show better performance in the trichloromethane destruction than the other two reactors. The increase in the oxygen content decreased the destruction efficiency, and the highest destruction efficiency was obtained at oxygen content 0.5%. The calculations for electron-molecule collisions indicated that the most abundant reactive species initiating the destruction of trichloromethane are metastable nitrogen molecules. The major byproducts were CO and Cl 2 , and the formations of NO 2 and N 2 O were also significant.

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“…To prevent further global warming, the semicon- ductor industry is committed to reducing the emission of PFCs to 10% below the emission level of 1995 by 2010 [2]. Thus, many developments of PFC emissions reduction have been performed in four general areas: process optimization, alternative chemistries, capture/recovery, and abatement [3]- [14].…”

Section: Introductionmentioning

confidence: 99%

High-Efficiency PFC Abatement System Utilizing Plasma Decomposition and Ca(OH)$_{2}$/CaO Immobilization

Suzuki

Ishihara

Sakoda

et al. 2008

IEEE Trans. Semicond. Manufact.

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In order to minimize contributions to global warming, it is important to develop a perfluorocompound (PFC) abatement system that can remove PFCs effectively with low electric power. We have developed a new PFC abatement system consisting mainly of a 2-MHz ICP plasma source and two Ca(OH) 2 /CaO columns operated under a decompression pressure. Reactive fluorinated compounds including SiF 4 are immobilized in the Ca(OH) 2 /CaO columns without a water scrubber. Stable compounds such as CF 4 are excited by the 2-MHz ICP plasma. When the emissions from an Si oxidation film etching process chamber were treated by this abatement system, F 2 equivalent removal efficiency was 99.6%, which was about one order of magnitude larger than that of a conventional abatement system. But the CO 2 equivalent removal efficiency was calculated to be 91.4% because over 95% of CO 2 equivalent emissions were caused by the plasma source power consumption of 2.4 kWh. It means that minimization of the plasma source power consumption, depending on PFC emissions, is a very effective method of minimizing contributions to global warming in a manner similar to improving the PFC removal efficiency.

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<tex>$hboxCF _4$</tex>Decomposition Using Inductively Coupled Plasma: Effect of Power Frequency

Cited by 23 publications

References 14 publications

Abatement of perfluorocompounds with microwave plasma in atmospheric pressure environment

Abatement of perfluorocompounds with microwave plasma in atmospheric pressure environment

Abatement of Trichloromethane by Using Nonthermal Plasma Reactors

High-Efficiency PFC Abatement System Utilizing Plasma Decomposition and Ca(OH)$_{2}$/CaO Immobilization

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