The capacitive type of radio frequency microelectromechanical systems (RF MEMS) switch is investigated for low driving voltages and low power consumption. The RF MEMS switch is actuated by electro-thermal forces and electrostatic forces at the same time, and then held the status by electrostatic forces only after driving. We also use complementary metal oxide semiconductor (CMOS) technology to integrate MEMS devices and integrated circuits (ICs) into a monolithic chip. The RF MEMS switch is fabricated using standard CMOS process, double poly-silicon four metal (2P4M), and the wet etching of MEMS fabrication is then used for post-processed. Experimental results show that the both actuation mechanisms, electro-thermal and electrostatic forces, are workable. The pull-in voltage of the switch for driving is about 7 volts. The insertion loss and the isolation of RF switch at a frequency of 5 GHz are 2.5 dB and 1.6 dB, respectively.
I. IntroductionMore and more communication standards are put in a cell phone such as GSM, WCDMA, Bluetooth, WiMAX, WLAN, GPS, and so on. Each standard has its own RF characteristics including central frequency, bandwidth, and gain. In order to simplify these RF blocks and cut down cost, reconfigurable RF front-end system might be a good solution for communication system of next generation. For a reconfigurable RF front-end, many MEMS technologies might use in the various applications, including high-Q filters, resonators, tunable capacitors, switches, etc. Among these components, the switch is one of the commonly used devices. Compare to PIN (positive-intrinsic-negative) or FET (fieldeffect transistor) diode switches, RF MEMS switches offer a substantially higher performance (e.g., isolation and insertion loss) at high frequency applications. In state-of-the-art, the packaged single-pole N-throw switches have been used in portable units and base stations. Besides, MEMS switches have been used in phase shifters and switching networks for defense, telecommunication, and systems satellite communications up to 20 GHz [1].On the other hands, parasitic capacitance turns into an important issue for the RF module design. The CMOS technique might be a suitable platform to integrate the RF MEMS components and circuits. There are several benefits for CMOS-MEMS such as reduced cost, improved yield, increased performance, and improved value. The CMOS-MEMS technology is utilizing the CMOS layers to pattern the layout of MEMS components and then using dry-etching or wet-etching post-processed techniques to release the MEMS structure to form the movable parts. Then the MEMS parts made by CMOS process can easily integrate with IC on chip.