This paper presents an extensive analysis aimed at quantifying the impact of all the key technology parameters on the upward heat flow in state-of-the-art InGaP/GaAs heterojunction bipolar transistors (HBTs) for various emitter areas and shapes. Extremely accurate thermal simulations are conducted in a relatively short time with a tool relying on a commercial 3-D finite-element method (FEM) solver and an in-house routine for automated geometry construction, optimized mesh generation, sequential solution, and data storing/processing. Design of Experiments is used to define a thermal resistance model as a function of the aforementioned parameters on the basis of a few FEM data. also studied the beneficial effect of a thermally-conductive and/or shorter path from the heat dissipation region to the sink, which can be obtained with flip-chip packaging 13,14,19,20,22,30 or alternative strategies based on thermal vias. 17,32 Unfortunately, almost all the thermal analyses presented in the above papers are (sometimes unacceptably) inaccurate: the real-and complex-device structures are always represented with simplified (or even oversimplified) domains to allow (1) the development of analytical models for the temperature distribution or (2) an easy construction/meshing of the 3-D geometry for numerical simulations; still now, in spite of the continuous improvement in PC performances, task (2) is not trivial if performed manually, especially when all technological details must be taken into account.Recently, the upward heat flow has been given attention in some works from the authors. [37][38][39][40] In particular, besides the metallization, the often overlooked role played by the emitter stack (previously investigated only in a study by Anholt 22 ) has been analyzed in a state-of-the-art InGaP/GaAs HBTs in previous papers [38][39][40] ; the relevance of these studies is driven by the low thermal conductivities of the ternary InGaAs and InGaP emitter layers (even lower than GaAs), which make thermal shunt solutions less effective. For this purpose, the authors have used a simulation/modeling strategy based on combining (1) a tool that relies on a 3-D finite-element method (FEM) software package aided by an in-house routine, and (2) Design of Experiments (DOE) to analytically derive a predictive thermal resistance model starting from a minimized number of FEM results. Contrary to prior work, the proposed tool ensures very high simulation accuracy: starting from the actual masks used for device fabrication, it allows an automated and extremely detailed construction/meshing of the 3-D transistor structure in the environment of the FEM solver. Thanks to this feature, it can be easily integrated into a standard design process, and can in principle be used for any device technology.This work aims at extending the analysis presented in Catalano et al 38 where the impact of emitter stack and metallization layers on the thermal behavior was evaluated for various emitter areas and shapes in single-finger InGaP/GaAs HBTs. Compared wi...