Heavily phosphorus-doped nanocrystalline diamond (P-NCD) has been grown by using a plasma-enhanced chemical vapor deposition technique and further applied as an electrode for the construction of supercapacitors. This P-NCD electrode shows a capacitance of 11.40 μF cm À 2 in 1.0 M Na 2 SO 4 at a scan rate of 10 mV s À 1 and behaves as a n-type semiconductor electrode in redox-active electrolyte of 0.05 M Fe(CN) 6 3À /4À + 1.0 M Na 2 SO 4 . The post-thermal treatment of as-grown P-NCD films in vacuum at high temperatures for several hours leads to the achievement of much higher capacitances. At the scan rates of 10 and 20 mV s À 1 , the capacitances are up to 2.01 and 63.56 mF cm À 2 for an electrical double layer capacitor and a pseudocapacitor, respectively. Such high capacitances originate from the improved electrical conductivity, varied surface state and surface functional groups, and changed content of noncarbon diamond inside the P-NCD films during the annealing treatment. Therefore, P-NCD films are quite promising as an electrode material for supercapacitor applications.[a] Dr.Electrochemical measurements were carried out on a CHI660E Potentiostat/Galvanostat (Shanghai Chenhua Inc., China) using a standard three-electrode cell, where the P-NCD film acted as the working electrode, an Ag/AgCl (3 M KCl) as the reference electrode, and a coiled Pt wire as the counter electrode. The effective area of the working electrode that exposed to the electrolyte was a circular area of approximately 0.05 cm À 2 . For the construction of diamond EDLCs and PCs, 1.0 M Na 2 SO 4 and 1.0 M Na 2 SO 4 containing 0.05 M K 3 Fe(CN) 6 /K 4 Fe(CN) 6 aqueous solutions were utilized, respectively. Their performance was examined using cyclic voltammetry at different scan rates, the galvanostatic charging/discharging method at different current densities, and electrochemical impedance spectroscopy technique at open circuit potentials in the frequency range of 0.01 to 10 6 Hz.