An important step in quantitative auger analysis: The use of peak to background ratio

Langeron, J.P.; Minel, L.; Vignes, J.‐L.; Bouquet, Stéphane; Pellerin, F.; Lorang, G.; Ailloud, P.; Hericy, J. Le

doi:10.1016/0039-6028(84)90269-3

Cited by 78 publications

(6 citation statements)

References 19 publications

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“…Since the times of analog measurements in the seventies of the past century, the peak-to-peak height ratio technique of two elements (in the differential mode) or, more exactly, the ratio of the peak-to-peak height of one element to the sum of those of the remaining elements in a spectrum 1 has been applied. Whereas Prutton et al 23 used the peak-to-background ratio in the normal N(E) mode in order to correct for topography effects, Langeron et al 24 explained the general advantage of using that ratio in the quantification of AES. They pointed out that a nonvanishing influence of backscattering on the peak-to-background ratio is expected.…”

Section: Discussionmentioning

confidence: 99%

Implementing the electron backscattering factor in quantitative sputter depth profiling using AES

Hofmann

Wang

2006

Surface & Interface Analysis

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Sputter depth profiling using Auger electron spectroscopy (AES) is influenced by the electron backscattering contribution to the AES intensity. When approaching an interface between two components having a different backscattering factor, the shape of the profile is characteristically distorted. This distortion is taken into account in a modified version of the mixing-roughness-information depth (MRI) model. The modification is based on the simplified assumption that the influence of the backscattering effect of the component below the interface increases exponentially with decreasing distance of the actual surface to the interface. Application of the modified MRI model is shown to yield excellent results of profile calculation for AES depth profiling of Si/W, C/Ta, C/Ti, and Au/TiO 2 interfaces, with backscattering factor ratios close to those predicted by the Ichimura-Shimizu relation. A simple correction of the backscattering influence is proposed and discussed.

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Section: Discussionmentioning

confidence: 99%

Implementing the electron backscattering factor in quantitative sputter depth profiling using AES

Hofmann

Wang

2006

Surface & Interface Analysis

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“…13 The value of this ratio depends on the primary energy but is specific for the specimen at a given primary energy. In particular, P/B is independent of the transmission, and when peak areas are used for P it is also independent of the resolution.…”

Section: Peak-to-background (Piand and Tail-to-peak (Tip) Ratios In An mentioning

confidence: 99%

Use of the direct energy spectra in Auger electron spectroscopy

Langeron

1989

Surface & Interface Analysis

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The approach to quantitative AES via background subtraction is discussed. Because the knowledge of the transmission function is very important, a possible method for its determination is described. Respective contributions of primary, secondary and inelastic Auger electrons to the background are then theoretidy Bspessed and application to the evaluatioo of peak-to-background and tail-to-peak ratios is brietly outlined. A method to normalize the spectra intensities using the background is presented. Fmlly, spectra combination is proposed as an alternative to background subtraction for quantitative AES. This last method provides information on in-depth homogeneity and chemical effects. INTRODUCTIONAlthough the differential energy spectrum is still widely used as a recording mode for AES, the development of counting techniques together with the availability of computers to record and process data has led to an increasing number of spectra now to be collected in the direct mode. In addition to the customary argument in favour of the direct energy spectrum that the area under the Auger peak can be related to physical parameters, it must be highlighted that the information specifically contained in the background can thus also be obtained.To date, the most frequently used analytical procedures involve a background removal routine before displaying the Auger electron peaks. Several background subtraction methods have already been published,' leading to different values for the relative areas under the peaks.In this paper, a simple theoretical treatment will be discussed to assess the respective contributions of primary, secondary and inelastic Auger electrons to the background. Examples of some analytical procedures will be given to illustrate which type of information can be extracted from an energy spectrum. Finally, methods based on normalization of the spectra via the use of the background will be presented. In particular, an alternative for quantitative Auger analysis will be proposed with spectra combination. CONTRIBUTIONS TO THE ENERGY SPECTRUMThroughout this paper, only the energy distribution of electrons produced after the irradiation of a target by an incident electron beam will be discussed in detail.An experimental measurement is always the convolution of the 'true' signal by the instrumental transmis- sion. Therefore, a precise assessment of the different contributions to the energy spectrum cannot be made without the knowledge of the electron spectrometer's transmission properties. Transmission of the electron spectrometerThe most popular electron spectrometer used in AES is the cylindrical mirror analyser (CMA). Although electron multiplier effects should be taken into account,' it is generally assumed that the transmission of a CMA simply varies as the energy of the emitted electrons E. Hence, the recorded electron distribution is EN(E) and can thus be used as a reference to determine other analyser transmissions when unknown. However, it must be pointed out that such a method can only be used provided ...

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“…They were quantitatively exploited using the peak to background ration (P/B), hereafter referred to as the Auger ratio. For Auger sputter profiling (ASP), a low-energy ion gun (electrostatic reflex ion source, ERIS) was developed in order to reduce the knock-on spreading effect; it delivered a 100 eV-50 f-LA AR+ ion beam in a 7 mm diameter spot [8,9].…”

Section: Analytical Techniquesmentioning

confidence: 99%

Role of helium plasma pretreatment in the stability of the wettability, adhesion, and mechanical properties of ammonia plasma-treated polymers. Application to the Al-polypropylene system

Tatoulian

Arefi‐Khonsari

Mabille-Rouger

et al. 1995

Journal of Adhesion Science and Technology

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An important step in quantitative auger analysis: The use of peak to background ratio

Cited by 78 publications

References 19 publications

Implementing the electron backscattering factor in quantitative sputter depth profiling using AES

Implementing the electron backscattering factor in quantitative sputter depth profiling using AES

Use of the direct energy spectra in Auger electron spectroscopy

Role of helium plasma pretreatment in the stability of the wettability, adhesion, and mechanical properties of ammonia plasma-treated polymers. Application to the Al-polypropylene system

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