1998
DOI: 10.1016/s0924-4247(98)00038-7
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An integrated thermopile structure with high responsivity using any standard CMOS process

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Cited by 33 publications
(10 citation statements)
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“…9 However, silicon-based temperature sensors used as thermopile structures must have a large number of couples in order to generate a meaningful output. 10 In addition, although silicon-based thermopiles have been successfully integrated into integrated circuit (IC) processing, [11][12][13] there are still certain impediments to commercial realization of thermopiles. As a substrate, silicon has high thermal conductivity of about 150 W/m/K at room temperature, 14 which compromises the thermopile efficiency.…”
Section: Introductionmentioning
confidence: 99%
“…9 However, silicon-based temperature sensors used as thermopile structures must have a large number of couples in order to generate a meaningful output. 10 In addition, although silicon-based thermopiles have been successfully integrated into integrated circuit (IC) processing, [11][12][13] there are still certain impediments to commercial realization of thermopiles. As a substrate, silicon has high thermal conductivity of about 150 W/m/K at room temperature, 14 which compromises the thermopile efficiency.…”
Section: Introductionmentioning
confidence: 99%
“…For the reasons of mass production, low cost and IC integration, CMOS compatible process was frequently employed to manufacture thermopile sensors. [1][2][3][4] In past years, poly silicon layers and aluminum layers were the most popular materials for forming thermopile elements [5][6][7][8]. The thermal conductivity of bulk aluminum is about 237 W/m-K and bulk titanium is 21.9 W /m· K. The enormous thermal conductivity of aluminum results in sensitivity drop.…”
Section: Introductionmentioning
confidence: 99%
“…Schaufelbuhl [3] reported a thermoelectric CMOS infrared sensor array composed of polysilicon/aluminum thermopiles with a combined Seebeck coefficient of 108 μV/K. Akin [7] utilized the n-poly/p + diffusion to fabricate thermocouples with a higher combined Seebeck coefficient of 750 μV/K. The most effective combination for raising the Seebeck coefficient is to connect the p-type and n-type polysilicon directly without the via metal in CMOS process.…”
Section: Introductionmentioning
confidence: 99%