Nuclear Instruments and Methods in Physics Research
 1983
DOI: 10.1016/0167-5087(83)90569-0
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An investigation of oxygen indiffusion during laser cleaning/annealing of silicon by means of the 16O(α, α0)16O resonance scattering

Z.L. Wang
1
,
J.F.M. Westendorp
2
,
F.W. Saris
3
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Cited by 28 publications
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