An Investigation on Electrorheological Fluid-assisted Polishing Process for Tungsten Carbide

Progress in the study of electrorheological polishing: A review

“…However, there are also ERP experimental results that show the increase of surface roughness under extremely high field strength (Zhang et al, 2010(Zhang et al, , 2011aZhao et al, 2012d). Zhao et al (2012a) concluded that too high electric field strength caused by too small a gap was also easy to scratch the surface because the polishing pad became too hard. Therefore, there was an optimal electric field strength.…”

“…As shown in Figure 1(a), ER particles formed chains when the workpiece did not rotate, and large diamond particles were distributed along the chains. When the workpiece was rotated, the chain yielded and broke at the weakest part of the electric field and immediately recovered, as shown in Figure 1(b) Thanks to the development of high-definition photography, Zhao et al (2012a) presented the microstructure of ERP fluid of abrasive and ER particles in silicone oil under an electric field. The morphology of the polishing fluid under the electric field can be shown more clearly.…”

“…In addition to the direct observation by photography (Kim et al, 2003; Kuriyagawa et al, 2002; Obara et al, 2007; Zhao et al, 2012a), the researcher also gave mathematical expressions to describe the behavior of the abrasive particles in ERP process. Realistic images allow one to visualize the behavior of the polishing solution and can lead to a better understanding of the results of the theoretical work.…”

“…So, the electric field intensity should have a suitable range. The strength of electric field affects the polishing result by influencing the shear yield stress of polishing fluid (Zhao et al, 2012a). In some ERP experiment results, only the decrease of surface roughness with applied field strength is studied (Hu et al, 2022; Wang et al, 2021; Zhang et al, 2005; Zhao et al, 2012b).…”