An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/ oxygen plasmas

Alexander, Morgan R.; Short, Robert D.; Jones, Frank R.; Stollenwerk, Manfred; Zabold, Jochen; Michaeli, Walter

doi:10.1007/bf00372203

Cited by 102 publications

(43 citation statements)

References 14 publications

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“…There were four component subpeaks representing Si–O bonding: (–O) 1 : [(CH 3 ) 3 SiO 1/2 ], (–O) 2 : [(CH 3 ) 2 SiO 2/2 ], (–O) 3 : [(CH 3 )SiO 3/2 ], and (–O) 4 : [SiO 4/2 ]. The (–O) 1 peak is centred at 101.5 eV, (–O) 2 is centred at 102.1 eV, (–O) 3 is centred at 102.8 eV, and (–O) 4 is centred at 103.4 eV 35 . The rightward shift of the Si 2p peak indicated that IB irradiation transformed atoms at the PDMS surface into higher oxidation states.…”

Section: Resultsmentioning

confidence: 97%

Control of the wrinkle structure on surface-reformed poly(dimethylsiloxane) via ion-beam bombardment

Park

Jeong

Jung

et al. 2015

Sci Rep

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We investigated the surface reformation of poly(dimethylsiloxane) (PDMS) elastomers by means of ion beam bombardment for fabricating wrinkle structures. Oxidation on the PDMS surface formed a silica-like outer layer that interacted with the inner PDMS layer, leading to the formation of wrinkle structures that minimized the combined bending energy of the outer layer and stretching energy of the inner layer. In addition, we controlled the amplitude and period of the wrinkle structures by adjusting the PDMS annealing temperature. As the PDMS annealing temperature was increased, the amplitude and period of the wrinkles formed by IB irradiation changed from 604.35 to 69.01 nm and from 3.07 to 0.80 μm, respectively.

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Section: Resultsmentioning

confidence: 97%

Control of the wrinkle structure on surface-reformed poly(dimethylsiloxane) via ion-beam bombardment

Park

Jeong

Jung

et al. 2015

Sci Rep

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“…The oxygen O 1s peaks presented for the three plasma polymer layers in Fig. 11 exhibit a shift of 1.3 eV towards high binding energy (which is the same for the Si 2p peak), indicating a change in silicon-oxygen chemistry 51 : in the absence of oxygen in the is formed in the presence of oxygen (O 1s peak appeared at about 533.5 eV).…”

mentioning

confidence: 75%

Deposition of polysiloxane‐like nanofilms onto an aluminium alloy by plasma polymerized hexamethyldisiloxane: characterization by XPS and contact angle measurements

Azioune¹,

Marcozzi²,

Revello³

et al. 2007

Surface & Interface Analysis

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“…One possible explanation is that the behaviour of oxygen binding to sulfur could be similar to silicon; the main binding energy shift occurs in the bonding of the first oxygen to the silicon (Alexander et al 1996). Addition of a second and third oxygen atom only causes a small shift in the silicon binding energy (Alexander et al 1996).…”

Section: Sulfur-containing Reference Materialsmentioning

confidence: 99%

XPS Study of Sulfur and Phosphorus Compounds with Different Oxidation States

Siow

Britcher

Kumar

et al. 2018

JSM

130

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In this report, we demonstrate that continuous improvement in XPS instruments and the calibration standards as well as analysis with standard component-fitting procedures can be used to determine the binding energies of compounds containing phosphorus and sulfur of different oxidation states with higher confidence. Based on such improved XPS analyses, the binding energies (BEs) of S2p signals for sulfur of increasing oxidation state are determined to be 166-167.5 eV for S=O in dimethyl sulfoxide, 168.1 eV for S=O 2 in polysulfone, 168.4 eV for SO 3 in polystyrene sulfonate and 168.8 eV for SO 4 in chondroitin sulfate. The BEs of P2p signals show the following values: 132.9 eV for PO 3 in triisopropyl phosphite, 133.3 eV for PO 4 in glycerol phosphate, 133.5 eV for PO 4 in sodium tripolyphosphate and 134.0 eV for PO 4 in sodium hexametaphosphate. These results showed that there are only small increases in the binding energy when additional oxygen atoms are added to the S-O chemical group. A similar result is obtained when the fourth oxygen or poly-phosphate environment is added to the phosphorus compound. These BE values are useful to researchers involved in identifying oxidation states of phosphorus and sulfur atoms commonly observed on modified surfaces and interfaces found in applications such as biomaterials, super-capacitors and catalysis. ABSTRAK Kajian ini menunjukkan bahawa penambahbaikan yang berterusan dalam spektroskopi foto-elektron x-ray (XPS), piawaian penentukuran dan prosedur pencocokan lengkung puncak, boleh menentukan tenaga pengikat untuk sebatian fosforus dan sulfur yang terdiri daripada pengoksidaan yang berbeza dengan lebih jitu. Berdasarkan analisis XPS ini, tenaga pengikat (BE) untuk puncak S2p daripada sebatian sulfur yang mempunyai pengoksidaan yang meningkat ialah: 166-167.5 eV untuk S=O dalam dimetil sulfoxida, 168.1 eV untuk S=O 2 dalam poli-sulfon, 168.4 eV untuk SO 3 dalam polistirena sulfonat dan 168.8 eV untuk SO 4 dalam kondroitin sulfat. BE untuk puncak P2p daripada sebatian fosforus menunjukkan bacaan berikut: 132.9 eV untuk PO 3 dalam tri-isopropil fosfit, 133.3 eV untuk PO 4 dalam fosfat gliserol, 133.5 eV untuk PO 4 dalam natrium tripolifosfat dan 134.0 eV untuk PO 4 dalam natrium hexametafosfat. Keputusan ini menunjukkan bahawa hanya ada peningkatan yang kecil dalam tenaga pengikat (eV) apabila atom oksigen ditambah kepada sebatian yang diikat oleh S-O. Keputusan yang sama diperoleh apabila persekitaran oksigen atau poli-fosfat keempat ditambah kepada sebatian fosforus. Nilai BE untuk sebatian sulfur dan fosforus ini adalah berguna untuk para penyelidik yang cuba mengenal pasti sebatian yang lazim terdapat di atas permukaan dan antara-muka untuk aplikasi seperti bio-bahan, super-kapasitor dan mangkin.

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An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/ oxygen plasmas

Cited by 102 publications

References 14 publications

Control of the wrinkle structure on surface-reformed poly(dimethylsiloxane) via ion-beam bombardment

Control of the wrinkle structure on surface-reformed poly(dimethylsiloxane) via ion-beam bombardment

Deposition of polysiloxane‐like nanofilms onto an aluminium alloy by plasma polymerized hexamethyldisiloxane: characterization by XPS and contact angle measurements

XPS Study of Sulfur and Phosphorus Compounds with Different Oxidation States

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