2021
DOI: 10.1109/led.2020.3040131
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Analysis and Simulation of Interface Quality and Defect Induced Variability in MgO Spin-Transfer Torque Magnetic RAMs

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Cited by 6 publications
(2 citation statements)
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“…The higher value of α bipolar ∼2.7, compared to α positive ∼0.1 and α negative ∼0.3, agrees with higher β bipolar . Another noteworthy trend is the consistently increasing β with stress voltage and T , again due to an enhancement in α caused by higher trap-assisted tunneling current [21] and thermal stress in the dielectric.…”
Section: F Weibull Slope Comparison For Different Stress Modesmentioning
confidence: 92%
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“…The higher value of α bipolar ∼2.7, compared to α positive ∼0.1 and α negative ∼0.3, agrees with higher β bipolar . Another noteworthy trend is the consistently increasing β with stress voltage and T , again due to an enhancement in α caused by higher trap-assisted tunneling current [21] and thermal stress in the dielectric.…”
Section: F Weibull Slope Comparison For Different Stress Modesmentioning
confidence: 92%
“…Noman et al [32] reported electron trapping-induced filament formation in TiO 2 -based resistive devices contributing to percolation path formation. With the large applied current density in our MgO devices, electron trapping could take place at preexisting oxygen vacancies, the presence of boron oxide or lattice mismatches at the CoFeB-MgO interface [4], [21] that can lead to strong localized fields. The trapped electrons result in greater current flow in the local region, which further induces more electron trapping.…”
Section: G Non-arrhenius Trend Of Mgo Breakdownmentioning
confidence: 99%