The effect of Furnace Annealing (FA) and Rapid Thermal annealing (RTA) on the structural and optical properties of GaAs1-xBix/GaAs single quantum wells (SQW) grown on (001) and (311)B substrates by molecular beam epitaxy (MBE) was investigated. The structural properties were investigated by high-resolution X-ray diffraction (HR-XRD) and Transmission Electron Microscopy (TEM). The Bi concentration profiles were determined by simulating the HR-XRD 2θ-ω scans using dynamical scattering theory to estimate the Bi content, lattice coherence and quality of the interfaces. The Bi composition was found to be similar for both samples grown on (001) and (311)B GaAs substrates. However, the simulations indicate that the Bi composition is not only limited in the GaAsBi QW layer but extends out of the GaAsBi QW towards the GaAs barrier. Photoluminescence (PL) measurements were performed as a function of temperature and laser power for samples with a nominal Bi composition of 3%. PL spectra showed that (001) and (311)B samples have different peak energies at 1.23 eV and 1.26 eV, respectively, at 10 K. After RTA at 300 o C for 2 mins, the PL intensity of (311)B and (001) samples was enhanced by a factor of ~2.5 and 1.75, respectively. However, for the (001) and (311)B FA samples an enhancement of the PL intensity by a factor of only 1.5 times could be