We investigated the origin of the high reverse leakage current in light emitting diodes (LEDs) based on (In,Ga)N/GaN nanowire (NW) ensembles grown by molecular beam epitaxy on Si substrates. To this end, capacitance deep level transient spectroscopy (DLTS) and temperature-dependent current-voltage (I-V) measurements were performed on a fully processed NW-LED. The DLTS measurements reveal the presence of two distinct electron traps with high concentrations in the depletion region of the p-i-n junction. These band gap states are located at energies of 570 ± 20 and 840 ± 30 meV below the conduction band minimum. The physical origin of these deep level states is discussed. The temperature-dependent I-V characteristics, acquired between 83 and 403 K, show that different conduction mechanisms cause the observed leakage current. On the basis of all these results, we developed a quantitative physical model for charge transport in the reverse bias regime. By taking into account the mutual interaction of variable range hopping and electron emission from Coulombic trap states, with the latter being described by phononassisted tunnelling and the Poole-Frenkel effect, we can model the experimental I-V curves in the entire range of temperatures with a consistent set of parameters. Our model should be applicable to planar GaN-based LEDs as well. Furthermore, possible approaches to decrease the leakage current in NW-LEDs are proposed. a) M. Musolino and D. van Treeck contributed equally to this work. b) Author to whom correspondence should be addressed. Electronic mail: treeck@pdi-berlin.de dependent current-voltage (I-V) measurements. On the basis of these data, we have developed a quantitative physical model able to describe the experimental I-V curves of NW-LEDs in the reverse bias regime for a wide range of temperatures. The assumptions made in this study should remain valid also for planar devices based on III-N heterostructures, thus making our model applicable also to conventional planar LEDs.The NW-LED structure employed in this work was grown by molecular beam epitaxy (MBE) on an AlN-buffered ndoped Si(111) substrate with the help of self-assembly processes. The active region of the NW-LED consists of four axial (In,Ga)N quantum wells (QWs) with an average In content of approximately 25%, separated by three GaN barriers. The last QW is immediately followed by a Mg-doped (Al,Ga)N electron blocking layer (EBL). The active region is embedded between two doped GaN segments designed such that an n-i-p diode doping profile is created. A schematic Si x O y n-Si(111) FIG. 1. (Color online) Schematic of the employed NW-LED structure. Note that the various dimensions are not to scale.