In
this work, performance comparison of various architectures of
field-effect transistors (FETs) introduced with transition metal dichalcogenide
(TMDC) MoS2 channels, which is attracting attention as
one of the technologies that will enable beyond-silicon technology,
was performed. By performing circuit-level benchmark for dynamic logic
circuit operation in sub-2 nm dimension, it is observed that the optimal
FET structure differs according to MoS2 layer numbers.
When two or more multilayer MoS2 is applied to a double-gate
and multistacked channel FET structure, the capacitance increases
due to the increase in structure complexity, but the improvement of
the current is greater, and the circuit operation speed increases.
It is similar to the scaling-down trend of silicon-based FETs. However,
in the case of monolayer MoS2, a simple single-gate planar
FET structure shows optimal circuit characteristics, which is analyzed
to be due to the excellent short-channel effect immunity of the monolayer
MoS2 channel and small parasitic capacitance. Layout effects
such as fan-out numbers and wiring load in integrated logic circuits
were also investigated in various MoS2-FET structures.
In addition, reliability analysis was performed through electrothermal
simulation of thermal issues related to the multigate transistor structure.