Analysis of the role of fluorine content on the thermal stability of a-C:H:F thin films

Effects of thermal annealing on the structural, mechanical, and tribological properties of hard fluorinated carbon films deposited by plasma enhanced chemical vapor deposition

“…The film shrinkage indicates that they did not have highly cross-linked structures, as supported by the presence of C -F 3 and C -F 2 groups by both infrared and XPS results. 13,36 The chemical state of the carbon atoms at the surface was probed by XPS. In Fig.…”

Interaction of Alcohols and Ethers with a-CFx Films

“…Fluorinated amorphous carbon ( a -CF x ) films have been produced by plasma-enhanced chemical vapor deposition (PECVD), ,− inductively coupled plasma chemical vapor deposition (ICP−CVD), , magnetron sputtering deposition, − and ion beam deposition. − The deposition parameters that influence the properties of a -CF x films are known to include the carbon-to-fluorine elemental ratio in the film, the radio frequency power used in deposition, the process pressure, and the substrate temperature. ,, The composition of the gas mixture used to deposit the a -CF x film is known to influence the fluorine content in the film 28,37-41 and its deposition rate. ,,,,,,, Increasing the fluorocarbon-to-hydrocarbon ratio in the gas mixture increases both the fluorine content in the film and the deposition rate.…”

“…Fluorine incorporation into carbon films is known to significantly influence their tribological, mechanical, and structural properties. Increasing fluorine content leads to gradual reduction of the friction, adhesion, ,,, hardness, ,,,,,,,, stress, ,,, elastic modulus, , and density of the film. , A series of hardness tests, stress tests, and density measurements of a -CF x films revealed that the diamond-like structure of carbon films with very low fluorine content is transformed into a graphite-like structure and then a polymer-like structure as the fluorine content of the film is increased. ,,, X-ray photoelectron spectroscopy (XPS) analysis of a -CF x films further supports this model by revealing that the fraction of CF 2 and CF 3 groups increases as the fluorine content of the film increases. ,,,,, Raman spectra exhibit a gradual increase in the intensities of the D bands relative to those of the G bands as the fluorine content of the film increases, revealing the structural change of the film from a diamond-like to a graphite-like and then a polymer-like structure. ,,,,,, …”

“…6 It has been proposed that fluorine incorporation in the carbon overcoat might improve its tribological and nonwetting properties while maintaining mechanical properties comparable to those of a-CH x films. [7][8][9][10] Fluorinated amorphous carbon (a-CF x ) films have been produced by plasma-enhanced chemical vapor deposition (PECVD), 7,[11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26] inductively coupled plasma chemical vapor (10) Jacobsohn, L. G.; Maia da Costa, M. E. H.; Triva-Airoldi, V. J.; Freire, F. L., Jr. Hard amorphous carbon-florine films deplosited by PECVD using C 2H2-CF4 gas mixture as precursor atmospheres. Diamond Relat.…”

Spin-Coating Polyimide Film on Hydrogenated DLC Film Surface Prepared by Ion Beam Deposition Method

“…These can be solved with F or N or Si elements doping into pure DLCH film to form the complex a-C:H:X film. [3][4][5][6] Another solution is the annealed treatment on DLCH film in order to get the transformation from amorphous to graphitic structure. However, such treatments will cause hardness significantly decreasing when annealed temperature is above certain critical transition point.…”