2012
DOI: 10.1016/j.mseb.2011.12.008
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Analytical model for the optical functions of indium gallium nitride with application to thin film solar photovoltaic cells

Abstract: This paper presents the preliminary results of optical characterization using spectroscopic ellipsometry of wurtzite indium gallium nitride (InxGa1-xN) thin films with medium indium content (0.38 Show more

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Cited by 17 publications
(10 citation statements)
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“…The experimental complex electric permittivity (ε) data for In 0.54 Ga 0.46 N 31 is given in Fig. S2 (see Supplementary information ).…”
Section: Resultsmentioning
confidence: 99%
“…The experimental complex electric permittivity (ε) data for In 0.54 Ga 0.46 N 31 is given in Fig. S2 (see Supplementary information ).…”
Section: Resultsmentioning
confidence: 99%
“…The doping concentrations used for each layer were 5 × 10 17 cm À3 (p-InGaN), 5 × 10 18 cm À3 (n-InGaN), 6 × 10 17 cm À3 (p-Si) and 6 × 10 17 cm À3 (n-Si). The calculations for electrical and optical properties for each layer were performed using the standard characteristics equations of a tandem solar cell [13][14][15][16][17]. InGaN is chemically an n-type semiconductor because of the presence of nitrogen in the composition.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…[76] A variety of techniques has been used to grow In x Ga 1Àx N/GaN nanocolumnar structures: radio-frequency molecular beam epitaxy (MBE), [82][83][84] plasmaassisted MBE, [85] CVD, [81,86] hydride vapor phase epitaxy (HVPE), [80,87] and plasma-assisted evaporation. [30,88,89] Regardless of the deposition technique, the growth of In x Ga 1Àx N nanocolumns is most dependent on three key deposition parameters: temperature, growth rate, and the III-V ratio. Low temperatures of 823 K (~550°C), high growth rates, and heavily nitrogen-rich conditions are found to promote the formation of the non-thermodynamically stable nanocolumns.…”
Section: Advanced Microstructures For In X Ga 1àx N Pvmentioning
confidence: 99%