“…[76] A variety of techniques has been used to grow In x Ga 1Àx N/GaN nanocolumnar structures: radio-frequency molecular beam epitaxy (MBE), [82][83][84] plasmaassisted MBE, [85] CVD, [81,86] hydride vapor phase epitaxy (HVPE), [80,87] and plasma-assisted evaporation. [30,88,89] Regardless of the deposition technique, the growth of In x Ga 1Àx N nanocolumns is most dependent on three key deposition parameters: temperature, growth rate, and the III-V ratio. Low temperatures of 823 K (~550°C), high growth rates, and heavily nitrogen-rich conditions are found to promote the formation of the non-thermodynamically stable nanocolumns.…”