Analytical model of secondary electron yield from metal surface with regular structures

Abstract

An analytical model of secondary electron (SE) emission (SEE) from metal surface with regular structure is presented. In this model, the quantitative relationship between the SE emission yield (SEY) and surface topography is examined. Using the idea of multi-generation for SE emission, the first-generation of SEs is considered as being dominant in total SEs. The shielding effect of the surface structures on the SE is found to be the main factor influencing final SEY. On the basis of the cosine distribution of secondary electrons emission direction, the quantitative relationship between the SEY and surface topography parameters is revealed. Then taking the rectangular and triangular grooves for example, the analytical formulas of first-generation SEY are derived for both normal and oblique incidence. The analytical results are then verified with the Monte Carlo simulation results and experimental data. The results show that a rectangular groove with a bigger depth-to-width ratio can suppress the SEE more efficiently. For a triangular groove, owing to having both enhancing and suppressing effects on SEE, a small groove angle is required for effective SEE suppression. The present analytical model gives an insight into the relationship between the SEY and the surface topography parameters and is helpful for the structure design to modify SEY.

Effect of rectangular grooves and checkerboard patterns on the electron emission yield

“…Materials with typical surface roughness, known to reduce SEY by trapping the secondary electrons is an option increasingly used. Both experimental and numerical works have been recently been published in this field [7][8][9][10][11][12][13][14][15][16][17] . The present work is in line with those approaches.…”

An efficient multipaction suppression method in microwave components for space application

“…However, the calculated SEE parameters are not accurate enough for the multipaction simulation nor for threshold analysis neither. Thus, combining with the practical SEY properties of material with concrete morphology, [26,27] a quantitative relationship between the surface treatment and discharge threshold is determined and simulated through the EM-PIC method.…”

Secondary electron emission yield from vertical graphene nanosheets by helicon plasma deposition

“…The SEE is affected by material properties, [15,16] incident particle energy, [17][18][19] incident particle angle, [20] sur-face geometry and surface cleanliness as well. [21] The methods to suppress the SEE are based mainly on two factors, one is the surface material, [22][23][24][25][26][27][28][29][30] such as TiN film, [23] C film, graphite and graphene film, [24][25][26][27][28][29][30] and the other is the surface structure, [31][32][33][34][35][36][37][38][39][40][41][42][43][44][45][46] such as triangular and rectangular grooves, [36][37][38] microporous arrays, [39][40][41][42] velvet surfaces, [43]…”