2021
DOI: 10.3390/coatings11111390
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Analytical Model of the Process of Thermal Barrier Coating by the MO CVD Method

Abstract: Integral regularities in the growth of 7YSZ thermal barrier coatings during MO CVD (Metal–Organic Chemical Vapor Deposition) are proposed. Within the framework of the model of the reacting boundary layer, the coating deposition process is considered as a process of independent global reactions of diffusion combustion of Zr(dpm)4 and Y(dpm)3 under convection conditions on a permeable surface. The rate of coating growth and the efficiency of using a precursor are analytically evaluated. The correctness of the pr… Show more

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Cited by 3 publications
(4 citation statements)
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“…The model considers the coating deposition process as independent global reactions of diffusion combustion under convection conditions on a permeable surface. The rate of coating growth and precursor efficiency are analytically evaluated, and the model's accuracy is confirmed through comparison with experimental data [99].…”
Section: Coupled Heat and Mass Transfer Equationsmentioning
confidence: 88%
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“…The model considers the coating deposition process as independent global reactions of diffusion combustion under convection conditions on a permeable surface. The rate of coating growth and precursor efficiency are analytically evaluated, and the model's accuracy is confirmed through comparison with experimental data [99].…”
Section: Coupled Heat and Mass Transfer Equationsmentioning
confidence: 88%
“…Lukashov et al propose an analytical model for the deposition of thermal barrier coatings via Metal-Organic CVD (MO CVD), using the reacting boundary layer model to analyze the diffusion combustion of precursors and evaluate coating growth rates and precursor efficiency [99]. Kleimanov et al present a numerical model of a CVD reactor used for producing oxide semiconductor layers, aiming to ensure uniform substrate heating and layer deposition by simulating the induction heating process and analyzing the impact of the boundary layer on deposition uniformity [46].…”
Section: Boundary Layer Approachesmentioning
confidence: 99%
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“…Such solutions can be used both for predicting the CVD system and for operational control during the production cycle, allowing for the control of nonlinear effects. Another approach that makes it possible to significantly simplify the modeling of the problem and, in some cases, make it possible to obtain analytical estimates is based on the use of the approximation of similarity of transfer processes [39]. When analyzing the reacting near-wall flow, it is possible to use correlations characterizing convective heat and mass transfer in non-reacting systems.…”
mentioning
confidence: 99%