2022
DOI: 10.26717/bjstr.2022.43.006937
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"Analytical Modelling of the Boron Diffusion and Etching Process for the Accurate Design and Fabrication by Bulk Micromachining Technology of the Silicon Capacitive Pressure Sensors for Biomedical Applications"

Abstract: The boron silicon layers doped by diffusion from non-oxidizing (boron nitride -BN) sources and oxidizing (boron tribromide -BBr 3 or boron doped oxides B 2 O 3 ) diffusion sources can be used as efficient etching-stop layers within the frame of the bulk micromachining technology to obtain silicon capacitive pressure sensors for biomedical applications. However, as the boron concentration during and after diffusion is not uniform, decreasing from the silicon surface to the silicon bulk according to the diffusio… Show more

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Cited by 3 publications
(1 citation statement)
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“…The microelectronic devices and systems have been changed our life forever, allowing the facile communication between people from various geographical areas of our planet [1,2], and the deep improvement of analysis and decision making [3,4] practically in all areas of science [5,6], education, healthcare [7,8] and industry [9]. In neuroscience, important advances were made by the introduction of a new concept of matter-related information [6], which allows a coherent approach of info-activity of human and living organisms [10].…”
Section: Introductionmentioning
confidence: 99%
“…The microelectronic devices and systems have been changed our life forever, allowing the facile communication between people from various geographical areas of our planet [1,2], and the deep improvement of analysis and decision making [3,4] practically in all areas of science [5,6], education, healthcare [7,8] and industry [9]. In neuroscience, important advances were made by the introduction of a new concept of matter-related information [6], which allows a coherent approach of info-activity of human and living organisms [10].…”
Section: Introductionmentioning
confidence: 99%