Angle-resolved X-ray reflectivity measurements during off-normal sputter deposition of VN

Krause, B.; Kaufholz, Marthe; Kotapati, S.; Schneider, Reinhard; Müller, Erich; Gerthsen, D.; Wochner, P.; Baumbach, Tilo

doi:10.1016/j.surfcoat.2015.07.030

Cited by 6 publications

(4 citation statements)

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“…Limits of this technique are the available range of x-ray energies with significant flux and the maximum count rate of the detector, but it has been successfully applied for real-time growth studies [77,81]. Another approach is an angular dispersive setup, using a Johansson monochromator [82] or divergent beams at a synchrotron as described by Krause et al [83]. Angular dispersive setups acquire a q z range by having several x-ray beams hit the sample with different incident angles and detecting several exit angles simultaneously with an area detector.…”

Section: Growth Oscillations During Molecular Beam Deposition Of the ...mentioning

confidence: 99%

Thin film growth studies using time-resolved x-ray scattering

Kowarik

2016

J. Phys.: Condens. Matter

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Thin-film growth is important for novel functional materials and new generations of devices. The non-equilibrium growth physics involved is very challenging, because the energy landscape for atomic scale processes is determined by many parameters, such as the diffusion and Ehrlich-Schwoebel barriers. We review the in situ real-time techniques of x-ray diffraction (XRD), x-ray growth oscillations and diffuse x-ray scattering (GISAXS) for the determination of structure and morphology on length scales from Å to µm. We give examples of time resolved growth experiments mainly from molecular thin film growth, but also highlight growth of inorganic materials using molecular beam epitaxy (MBE) and electrochemical deposition from liquids. We discuss how scaling parameters of rate equation models and fundamental energy barriers in kinetic Monte Carlo methods can be determined from fits of the real-time x-ray data.

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Section: Growth Oscillations During Molecular Beam Deposition Of the ...mentioning

confidence: 99%

Thin film growth studies using time-resolved x-ray scattering

Kowarik

2016

J. Phys.: Condens. Matter

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“…Our goal is to obtain films with a pure phase, free strain and fine particles with controlled morphology. Interestingly, Krause et al have reported the microstructure-property relationship of reactive magnetron sputtered VeN films deposited at different deposition angles [17]. In our recent study, we evaluated the influence of nitrogen partial pressure on the microstructure and mechanical and tribological behavior of V-C-N coatings [18].…”

mentioning

confidence: 96%

Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings

Aissani

Alhussein

Nouveau

et al. 2019

Surface and Coatings Technology

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We investigated the effect of film thickness on the structure and properties of VeN coatings deposited by magnetron sputtering in an argon and nitrogen atmosphere. The nitrogen percentage was changed between 10 and 20%. Firstly, structural and morphological properties of VeN films were observed, analyzed and subsequently followed by a detailed investigation on the mechanical and tribological properties of these coatings. It has been shown that film structure, hardness and wear resistance significantly changed with varying the film thickness and the nitrogen percentage. In the case of films deposited under 10%N 2 , the presence of V 2 N phase was evident. With increasing nitrogen ratio in the deposition chamber from 10 to 20%, the structure was changed from (hc)V 2 N to multi phases of V 2 N and (fcc) VN (formation of different vanadium nitrides). The thick films containing more nitrogen were slightly dense compared to the thinner ones presenting rough surface and columnar morphology. Nanoindentation measurements showed that film mechanical behavior depends on its thickness, nitrogen percentage and microstructural features. The film hardness first increased with its thickness and then decreased. The highest hardness of 26.2 GPa was obtained for the film deposited under 20%N 2 , which is correlated with its dense structure and film stoichiometry. The film thickness has a significant effect on the tribological properties of VeN films. The minimum friction coefficient of 0.4 was found for the thickest film of 2500 nm. The wear rate gradually decreased with increasing the film thickness, due to the high hardness, presence of VN phase and the strong adhesion between film and substrate.

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“…Recent examples of XRR for in-situ processes include studies of pulsed laser deposition (PLD) (Ferguson et al, 2011;Bauer et al, 2014;Chinta et al, 2012), molecular beam epitaxy (MBE) (Nahm & Engstrom, 2016;Lee et al, 2014), atomic layer deposition (ALD) (Devloo-Casier et al, 2014;Klug et al, 2015;Ju et al, 2017), sputter deposition (Krause et al, 2015;Sinsheimer et al, 2013;Bein et al, 2015), and electrochemical reactions (Chang et al, 2014;Golks et al, 2012;Plaza et al, 2016).…”

Section: Introductionmentioning

confidence: 99%

Quick X-ray reflectivity using monochromatic synchrotron radiation for time-resolved applications

Joress

Brock

Woll

2018

J Synchrotron Radiat

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We describe and demonstrate a new technique for parallel collection of x-ray reflectivity data, compatible with monochromatic synchrotron radiation and flat substrates, and apply it to the in-situ observation of thin-film growth. The method employs a polycapillary x-ray optic to produce a converging fan of radiation, incident onto a sample surface, and an area detector to simultaneously collect the XRR signal over an angular range matching that of the incident fan. Factors determining the range and instrumental resolution of the technique in reciprocal space, in addition to the signalto-background ratio, are described in detail. Our particular implementation records is the first method that is both sample-independent and compatible with the highly collimated, monochromatic radiation typical of 3rd generation synchrotron sources.Further, our technique can be readily adapted for use with laboratory-based sources.

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Angle-resolved X-ray reflectivity measurements during off-normal sputter deposition of VN

Cited by 6 publications

References 31 publications

Thin film growth studies using time-resolved x-ray scattering

Thin film growth studies using time-resolved x-ray scattering

Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings

Quick X-ray reflectivity using monochromatic synchrotron radiation for time-resolved applications

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