The impact of the Ag9+ ion irradiation on the characteristics of nickel oxide (NiO) films with several ion fluences including 1x1012, 1x1013, and 1x1014 ions/cm2 has been studied. These films were deposited over fluorine-doped tin oxide substrate via spin coating technique. Then, structural, optical, vibrational, and electrical characteristics were investigated employing different techniques. The change in the structure due to Ag9+ ion has been studied by grazing-incidence X-ray diffraction. A slight improvement in crystalline nature of NiO thin film was observed at 1x1012 ions/cm2 ion fluence that can be understood via thermal spike model A decrement in value of transmission has been observed in the case of all thin films with ion fluence of Ag9+ ion. In addition, it was also observed that samples exposed to Ag9+ ions resulted in reduced intensity of the 1LO and 2LO modes in Raman spectrum. The reduced intensity of the Raman modes indicates the increment in the lattice defects. Further, atomic force microscopy analysis showed that increment in the ion fluences of incident Ag9+ on NiO thin films led to an enhancement in surface roughness. Moreover, the Hall effect measurements were also carried out to examine the electrical characteristics of NiO films.