1976
DOI: 10.1002/pssb.2220730242
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Anisotropic Size Effect in Thin Aluminium Films

Abstract: A practical calculation of the anisotropic size effect of aluminum is made on the basis of the realistic 4-OPW Fermi surface and the anisotropic relaxation time model. Measurements are done for three crystallographic orientations. The theoretical prediction is in good agreement with the experimental data. Ausgehend voneiner realistischen 4-OPW-Fermifliiche und vom anisotropen Relaxationszeit-Model1 werden Berechnungen des anisotropen Size-Effektes von Aluminium durchgefiihrt. Fiir drei Kristallorientierungen w… Show more

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Cited by 18 publications
(8 citation statements)
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“…For example, the value of p(4.2 K) for the thickest <110> specimen suggests that the size effect due to the { 100) surface is significantly larger than that due to the { 110) surface. This is consistent with previous experiments on the anisotropic size effect in thin aluminium films [9]. If such a contribution from the side surface is negligible to the total resistivity, the FuchsSondheimer theory with a suitable value of pblb as described above will be plausible to estimate the bulk residual resistivity, p,, at 4.2 K for the specimens studied.…”
Section: Thickness Dependence Of P(42 K)supporting
confidence: 90%
“…For example, the value of p(4.2 K) for the thickest <110> specimen suggests that the size effect due to the { 100) surface is significantly larger than that due to the { 110) surface. This is consistent with previous experiments on the anisotropic size effect in thin aluminium films [9]. If such a contribution from the side surface is negligible to the total resistivity, the FuchsSondheimer theory with a suitable value of pblb as described above will be plausible to estimate the bulk residual resistivity, p,, at 4.2 K for the specimens studied.…”
Section: Thickness Dependence Of P(42 K)supporting
confidence: 90%
“…Experimentally, an anisotropic size effect has been measured for Al, using single crystal rods with different major surface orientations and in-plane transport directions. 10,11 However, the results did not match the theoretical expectations, such that it is unclear if the observed effect is related to the anisotropy in the Fermi surface, anisotropic electron scattering at different crystal facets, or impurities that change the carrier relaxation time near zone boundaries. 11 This question regarding the physical origin for the anisotropy in the size effect is the primary motivation for the study presented in this article, which tests the hypothesis that the resistivity anisotropy is primarily due to the anisotropy in the Fermi surface.…”
Section: Introductionmentioning
confidence: 89%
“…10,11 However, the results did not match the theoretical expectations, such that it is unclear if the observed effect is related to the anisotropy in the Fermi surface, anisotropic electron scattering at different crystal facets, or impurities that change the carrier relaxation time near zone boundaries. 11 This question regarding the physical origin for the anisotropy in the size effect is the primary motivation for the study presented in this article, which tests the hypothesis that the resistivity anisotropy is primarily due to the anisotropy in the Fermi surface. This is done by comparing the experimentally measured resistivity with results from a Boltzmann transport model that uses the electronic structure calculated from first-principles and therefore correctly accounts for the anisotropy in the Fermi surface and velocity.…”
Section: Introductionmentioning
confidence: 89%
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“…The essential additional ingredient is significant Fermi surface (FS) anisotropy. Early theoretical consideration of ellipsoidal Fermi surfaces 8 11 led to predictions of transport anisotropies, but experiments in aluminium 12 , 13 did not resolve such effects. Recent results on epitaxial tungsten thin films have detected a growth-direction dependence of the resistance when the films are thin enough to be in the ballistic limit in the direction perpendicular to the substrate 14 .…”
Section: Mainmentioning
confidence: 99%