2014
DOI: 10.1088/1674-1056/23/8/088111
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Annealing effect of platinum-incorporated nanowires created by focused ion/electron-beam-induced deposition

Abstract: Focused ion-beam-induced deposition (FIBID) and focused electron-beam-induced deposition (FEBID) are convenient and useful in nanodevice fabrication. Since the deposition is from the organometallic platinum precursor, the conductive lines directly written by focused ion-beam (FIB) and focused electron-beam (FEB) are carbon-rich materials. We discuss an alternative approach to enhancing the platinum content and improving the conductivity of the conductive leads produced by FIBID and FEBID, namely an annealing t… Show more

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Cited by 11 publications
(7 citation statements)
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“…% . Additionally, several groups have explored subsequent coating processes, such as post-electron beam-induced curing, , co-deposition with purification gases, , beam-induced post-purification with oxidizing and reducing precursors, post-deposition annealing, ,, and synchronized pulsed laser FEBID, , with all aimed at improving material properties without sacrificing the nanoscale 3D direct-write attributes that make the process attractive.…”
Section: Introductionmentioning
confidence: 99%
“…% . Additionally, several groups have explored subsequent coating processes, such as post-electron beam-induced curing, , co-deposition with purification gases, , beam-induced post-purification with oxidizing and reducing precursors, post-deposition annealing, ,, and synchronized pulsed laser FEBID, , with all aimed at improving material properties without sacrificing the nanoscale 3D direct-write attributes that make the process attractive.…”
Section: Introductionmentioning
confidence: 99%
“…Given the dielectric nature of amorphous carbon, post-fabrication processes have been employed to improve the conductivity of as-deposited EBID structures. [6][7][8] With annealing, for instance, the size of the beam-deposited metal nanoparticles increases and the amorphous carbon is either crystalized or removed from the structure 9 . In most cases, an oxygen atmosphere is used to etch the amorphous carbon matrix.…”
Section: Introductionmentioning
confidence: 99%
“…In most cases, an oxygen atmosphere is used to etch the amorphous carbon matrix. [9][10] Unfortunately, this process may result in the onset of structural voids and it is not applicable to carbon-based devices. 10 As early as 1996, IBID of W was employed in electrical transport studies of discrete CNTs.…”
Section: Introductionmentioning
confidence: 99%
“…However, the resistance dropped to 1 GΩ upon thermal exposure, confirming the presence of oversprayed Pt connectivity between the adjacent Pt lines. The change in resistance may be attributed to the removal of carbon impurities or/and crystallization of carbon and Pt in the over-deposits [41]. With further reduction in the line spacing up to 50 nm, the resistance consistently decreased, particularly in the annealed samples.…”
Section: Resultsmentioning
confidence: 99%