Annealing effect on the structure relaxation and mechanical properties of a Polytetrafluoroethylene film by RF-magnetron sputtering

Yu, Yueling; Ma, Yi; Huang, Xianwei; Song, Yuxuan; Zhang, Taihua; Lu, Chao

doi:10.1016/j.surfcoat.2020.126591

Cited by 9 publications

(6 citation statements)

References 37 publications

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“…Evidently, the WCA was nearly thicknessindependent and stabilized around 109°∼110°. The hydrophobicity of the as-deposited PTFE film was consistent with the previous report [16]. The constant WCA could be expected that surface structure was similar by AFM for all the samples.…”

Section: The Hydrophobicity Of Ptfe Filmsupporting

confidence: 90%

“…Kobayashi et al [15] observed that the molecules in PTFE films were increasingly oriented normal to the substrate surface with increasing annealing temperature. In our previous report, the PTFE film density was greatly increased with increasing annealing temperature and the optimal mechanical properties could be obtained by annealing at 100 °C [16]. On the other hand, the annealing induced structure relaxation would change the surface morphology and form an island structure on the PTFE surface [17].…”

Section: Introductionmentioning

confidence: 95%

“…In this report, we fabricated high-quality PTFE films with a series of thickness over a wide range of tens of nanometers to micrometers by RF magnetron sputtering. Relying on nanoindentation measurement [18,19], the mechanical properties including elastic modulus, hardness, strain rate sensitivity, creep resistance, and friction coefficient have already been detected in these PTFE films with different structure states [16,17,20]. The deposition process and growth mode of PTFE film by magnetron sputtering had not been systematically investigated yet.…”

Section: Introductionmentioning

confidence: 99%

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Unveiling the growth mode and structure relaxation of Polytetrafluoroethylene film by radio-frequency magnetron sputtering

et al. 2022

Mater. Res. Express

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Relying on radio-frequency (RF) magnetron sputtering, Polytetrafluoroethylene (PTFE) films with a series of thicknesses in the range from 80 to 2000 nm were prepared on silicon substrates. The surface morphology and roughness of the PTFE films were measured by atomic force microscope (AFM) technology at microscale. Results indicated that the PTFE film grew in an island pattern during sputtering, while the surface roughness of PTFE films was almost invariable throughout the sputtering process. Then the structure relaxation of PTFE film annealed at 100℃ for 15-480 mins was investigated. Annealing treatment induced columnar protrusions on the PTFE surface, which was due to the flow and rearrangement of molecules. During annealing duration, the columnar structures could continuously rearrange and decompose, and therefore lowering film thickness from 2000 to 1110 nm with increasing annealing time. Due to molecule flow and redistribution of the annealed film, the columnar structures were formed on the surface, which resulted in the higher roughness. Finally, the effects of film thickness and annealing time on the hydrophobicity were also studied.

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Section: The Hydrophobicity Of Ptfe Filmsupporting

confidence: 90%

Section: Introductionmentioning

confidence: 95%

Section: Introductionmentioning

confidence: 99%

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Unveiling the growth mode and structure relaxation of Polytetrafluoroethylene film by radio-frequency magnetron sputtering

et al. 2022

Mater. Res. Express

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“…Obviously, time-dependent plastic deformation occurred during holding stages even for small peak loads, as shown in the inset. Although atomic diffusion of the KDP crystal was unable to occur at room temperature, the high stress beneath the indenter could also facilitate the creep flow, particularly for the materials with a low melting point or soft nature [ 36 , 37 ]. Notwithstanding, it was held in the plastic region (the minimum holding strain was beyond the elastic limit of KDP crystal), the time-dependent plastic deformation herein could also be defined as creep flow.…”

Section: Resultsmentioning

confidence: 99%

The Strain Rate Sensitivity and Creep Behavior for the Tripler Plane of Potassium Dihydrogen Phosphate Crystal by Nanoindentation

Mao

Liu

et al. 2021

Micromachines

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As an excellent multifunctional single crystal, potassium dihydrogen phosphate (KDP) is a well-known, difficult-to-process material for its soft-brittle and deliquescent nature. The surface mechanical properties are critical to the machining process; however, the characteristics of deformation behavior for KDP crystals have not been well studied. In this work, the strain rate effect on hardness was investigated on the mechanically polished tripler plane of a KDP crystal relying on nanoindentation technology. By increasing the strain rate from 0.001 to 0.1 s−1, hardness increased from 1.67 to 2.07 GPa. Hence, the strain rate sensitivity was determined as 0.053, and the activation volume of dislocation nucleation was 169 Å3. Based on the constant load-holding method, creep deformation was studied at various holding depths at room temperature. Under the spherical tip, creep deformation could be greatly enhanced with increasing holding depth, which was mainly due to the enlarged holding strain. Under the self-similar Berkovich indenter, creep strain could be reduced at a deeper location. Such an indentation size effect on creep deformation was firstly reported for KDP crystals. The strain rate sensitivity of the steady-state creep flow was estimated, and the creep mechanism was qualitatively discussed.

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“…[35][36][37] However, studies on the thermal properties of PPFC thin films fabricated by sputtering of a bulk PTFE target have only been reported up to 300 C, and there are no reports on thermal properties near the T m . 38,39 Consequently, it is difficult to apply to high-temperature environments. In particular, to apply PPFC thin films to high-tech components (such as displays and semiconductors) that generate significant heat inside the devices, it is essential to understand how the physical properties of PPFC thin films vary with temperature.…”

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confidence: 99%

Investigation of thermal property of plasma‐polymerized fluorocarbon thin films

Cho

Song

Kim

et al. 2022

Polymers for Advanced Techs

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The physical property changes in the plasma‐polymerized fluorocarbon (PPFC) thin films near the melting temperature (Tm) were investigated through chemical structure analysis. The PPFC thin films, produced by semi‐crystalline polytetrafluoroethylene (PTFE)‐based polymer sputtering target, form amorphous polymers with outstanding properties, such as high water repellency and high optical transmittance, electrical insulation, and chemical resistance. Interestingly, in‐situ X‐ray photoelectron spectroscopy analysis revealed that the PPFC thin films maintained their physical properties at temperatures above the Tm in vacuum and exhibited properties similar to those of bulk PTFE while maintaining amorphous structure. Therefore, this thin film can be applied to various devices and surface coatings manufactured at high temperatures.

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Annealing effect on the structure relaxation and mechanical properties of a Polytetrafluoroethylene film by RF-magnetron sputtering

Cited by 9 publications

References 37 publications

Unveiling the growth mode and structure relaxation of Polytetrafluoroethylene film by radio-frequency magnetron sputtering

Unveiling the growth mode and structure relaxation of Polytetrafluoroethylene film by radio-frequency magnetron sputtering

The Strain Rate Sensitivity and Creep Behavior for the Tripler Plane of Potassium Dihydrogen Phosphate Crystal by Nanoindentation

Investigation of thermal property of plasma‐polymerized fluorocarbon thin films

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