1998
DOI: 10.1016/s0040-6090(97)00733-5
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Annealing effects on opto-electronic properties of sputtered and thermally evaporated indium-tin-oxide films

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Cited by 96 publications
(47 citation statements)
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“…Because applying a heat treatment to the nanocomposite films is an important step in developing the quantum dot, as discussed in section 3.3, it is necessary to understand the influence that temperature can have on the properties of ITO [12][13][14][15]. The two most prominent reactions that occur in ITO films during thermal anneals are grain growth and oxygen diffusion into the films, both of which can have pronounced effects on the resulting electrical and optical properties.…”
Section: Materials Selectionmentioning
confidence: 99%
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“…Because applying a heat treatment to the nanocomposite films is an important step in developing the quantum dot, as discussed in section 3.3, it is necessary to understand the influence that temperature can have on the properties of ITO [12][13][14][15]. The two most prominent reactions that occur in ITO films during thermal anneals are grain growth and oxygen diffusion into the films, both of which can have pronounced effects on the resulting electrical and optical properties.…”
Section: Materials Selectionmentioning
confidence: 99%
“…This happens because of a rapid grain growth process that occurs at these temperatures, removing any absorbing defects. As this process takes place, the conductivity is also greatly increased as the rapid grain growth spurs an increase in the oxygen vacancy concentration [12]. Because oxygen vacancies are so vital to the film's conductivity, it is important to note that the atmospheric partial pressure of oxygen inside the furnace can profoundly affect the resistivity.…”
Section: Materials Selectionmentioning
confidence: 99%
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“…Для получения прозрачных и про-водящих пленок ITO используют в основном два способа нанесе-ния: магнетронное распыление и электронно−лучевое испарение. В работах [1,8] было показано, что магнетронное распыление создает дефекты кристаллической струк-туры в подложке, существенно повышающие контактное сопро-тивление. Напротив, пленки, по-лученные электронно−лучевым испарением, не портили поверх-ность полупроводника, но после нанесения были непрозрачны и имели высокое удельное сопро-тивление [1,2,8].…”
Section: Introductionunclassified
“…A current spreading layer fabricated from a transparent conductor of low sheet resistance is therefore employed in all high efficiency devices in order to spread current throughout the p-cladding region of the LED and increase the current-injected area without having to increase the size or geometry of the contact. Practical current spreading layers composed of AlGaAs, 6 GaP 7 and indium tin oxide 8 ͑ITO͒ have been realized.…”
Section: Introductionmentioning
confidence: 99%