2014
DOI: 10.1155/2014/796759
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Annealing Heat Treatment of ZnO Nanoparticles Grown on Porous Si Substrate Using Spin-Coating Method

Abstract: ZnO nanoparticles were successfully deposited on porous silicon (PSi) substrate using spin-coating method. In order to prepare PSi, electrochemical etching was employed to modify the Si surface. Zinc acetate dihydrate was used as a starting material in ZnO sol-gel solution preparation. The postannealing treatments were investigated on morphologies and photoluminescence (PL) properties of the ZnO thin films. Field emission scanning electron microscopy (FESEM) results indicate that the thin films composed by ZnO… Show more

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Cited by 41 publications
(19 citation statements)
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“…The average surface roughness of nanostructured film is increased at 400 °C due to non-uniformity of ZnO nanoparticles size. At annealing temperature of 500 °C, the crystalline quality increases due to the atom arrangements being in favourable position and therefore making the average surface roughness decrease [18]. Besides, the size of ZnO nanoparticles was more uniform at this annealing temperature as seen in FESEM images.…”
Section: Introductionmentioning
confidence: 77%
“…The average surface roughness of nanostructured film is increased at 400 °C due to non-uniformity of ZnO nanoparticles size. At annealing temperature of 500 °C, the crystalline quality increases due to the atom arrangements being in favourable position and therefore making the average surface roughness decrease [18]. Besides, the size of ZnO nanoparticles was more uniform at this annealing temperature as seen in FESEM images.…”
Section: Introductionmentioning
confidence: 77%
“…Table 1 shows the plane distance, d and crystallite size, D in different annealing temperature. Plane distance of each plane in was calculated by Bragg's formula in Equation (1). Besides, an estimation of crystalline size, D based on plane distance for each plane is also calculated using Equation (2).…”
Section: Resultsmentioning
confidence: 99%
“…Zinc oxide (ZnO) is one of them. It becomes popular due to properties of a large exciton binding energy of 60 meV and and a wide band gap (E g ) of 3.37 eV [1]. In addition, good chemical and thermal stability, non-toxic material and high transparency in room temperature are additional advantages in devices fabrication [2].…”
Section: Introductionmentioning
confidence: 99%
“…The average diameter of the ZnO nanopowder increases from 408nm to 451nm when the annealing temperature is raised from 300°C to 400°C. This can be due to thermal expansion, in which the kinetic energy of the atoms increases as the annealing temperature rises [47]. But the average diameter of the ZnO nanopowder decreases to 367nm at 500°C and 359nm at 600°C.…”
Section: Surface Morphologymentioning
confidence: 99%