Electron cyclotron resonance deposition, structure, and properties of oxygen incorporated hydrogenated diamondlike amorphous carbon films J. Appl. Phys. 96, 5456 (2004); 10.1063/1.1804624 Amorphous silicon nitride films of different composition deposited at room temperature by pulsed glow discharge plasma immersion ion implantation and deposition High-resolution optical emission spectra of the CN(B 2 ⌺ ϩ -X 2 ⌺ ϩ ) and CH(A 2 ⌬ -X 2 ⌸) transitions were observed in the dissociative excitation reaction of CH 3 CN with the microwave-discharge flow of Ar. The H 2 O molecules contained in the starting materials and/or adsorbed on the wall of the apparatus were removed by using P 2 O 5 as a desiccant. The pressure of Ar, P Ar , was in the range of 0.1-0.8 Torr. From the simulation analysis of the observed spectra, the ratio of the concentrations of the CH(A 2 ⌬) and CN(B 2 ⌺ ϩ ) states, N CH(A) /N CN(B) , was determined as 0.09-0.41. It was indicated that the CN(B 2 ⌺ ϩ ) state was formed via the ion-electron recombination as well as the energy transfer from the metastable state of Ar. Based on the correlation between the N CH(A) /N CN(B) and ͓N͔/͓͑N͔ϩ͓C͔͒ ratios reported in the system without desiccation ͓Jpn. J. Appl. Phys. 40, 332 ͑2001͔͒, the ͓N͔/͓͑N͔ϩ͓C͔͒ ratio in the desiccated system was predicted to be Ϸ0.18. The hydrogenated-amorphous carbon nitride films prepared under the conditions of P Ar ϭ0.1, 0.4, 0.6, and 0.8 Torr were characterized by the Rutherford backscattering ͑RBS͒ analysis and the Fourier transform infrared ͑FTIR͒ spectroscopy. The observed ͓N͔/͓͑N͔ϩ͓C͔͒ ratios of the films were in the range of 0.17-0.21, being in good agreement with the above prediction. The structure of the films was independent of P Ar . The observed correlation between the N CH(A) /N CN(B) and ͓N͔/͓͑N͔ϩ͓C͔͒ ratios can be rationalized by the consideration that the relative concentrations of the CH(A 2 ⌬) and CN(B 2 ⌺ ϩ ) states and those of the precursor free radicals of the films are supposed to originate commonly to the relative concentrations of the active species of the discharge flow of Ar.