Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997
DOI: 10.1109/pvsc.1997.654208
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Anti-phase domain-free GaAs on Ge substrates grown by molecular beam epitaxy for space solar cell applications

Abstract: Elimination of anti-phase domains (APD's), threading dislocations and uncontrolled interface diffusion are critical considerations for achieving maximum design flexibility and high efficiency in multi-bandgap III-

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Cited by 9 publications
(8 citation statements)
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“…The APDs arise in the GaAs buffer layer epitaxially grown on the (001) Ge substrate due to mixed nucleation of Ga and As atoms on the non-polar Ge surface. 13,24 As the growth proceeds, A region containing two GaAsBi APDs near the GaAs buffer layer is shown in Fig. 3 APDs.…”
Section: Atomicmentioning
confidence: 99%
“…The APDs arise in the GaAs buffer layer epitaxially grown on the (001) Ge substrate due to mixed nucleation of Ga and As atoms on the non-polar Ge surface. 13,24 As the growth proceeds, A region containing two GaAsBi APDs near the GaAs buffer layer is shown in Fig. 3 APDs.…”
Section: Atomicmentioning
confidence: 99%
“…Further improvements in conversion efficiency of GaAs-on-Si solar cells must be attained because higher minority-carrier lifetime of 10.5ns that is due to low density of threading dislocations as low as 8x10 5 cm -2 has been obtained using SiGe buffer layer by the Ohio State Univ. [22]. 17.1% (AM0) efficiency (Voc=1.023 V, Jsc=28.3mA/cm 2 , FF=80.5%) has been realized with GaAs single-junction solar cell with 0.04 cm 2 area on Si by using SiGe buffer layer [22].…”
Section: Approaches Of High Efficiency Gaas On Si Single-junction Sol...mentioning
confidence: 99%
“…[22]. 17.1% (AM0) efficiency (Voc=1.023 V, Jsc=28.3mA/cm 2 , FF=80.5%) has been realized with GaAs single-junction solar cell with 0.04 cm 2 area on Si by using SiGe buffer layer [22].…”
Section: Approaches Of High Efficiency Gaas On Si Single-junction Sol...mentioning
confidence: 99%
“…Also, graded Si 1-x Ge x layer on the Si substrate is suggested (x: 0 to 1), which would favour integration of GaAs based devices on Si substrate [7,8]. Furthermore, the growth conditions of III-V compound semiconductor heterostructures on Ge substrate have to be optimized because the interface between polar on nonpolar semiconductor leads to the formation of anti-phase domains (APDs), threading dislocations (TDs), and inter-diffusion of GaAs and Ge [8][9][10]. Researchers have also addressed different techniques such as off-cut substrates, migration enhanced epitaxy (MEE) layer and so on to overcome above mentioned problems [8,[11][12][13][14].…”
Section: Introductionmentioning
confidence: 99%