Abstract. In this study, we fabricated n-type bifacial solar cells by liquid phase deposited (LPD) SiO 2 films as surface passivation layers. We have found that the growth conditions of LPD SiO 2 films have great influence on the deposition rate of the LPD SiO 2 films. Besides, the surface passivation effects of LPD SiO 2 films on both p-type and n-type silicon wafers are enormously improved after annealing at a temperature higher than 700 °C. Finally, the optimized LPD SiO 2 films have been successfully applied to the n-type bifacial silicon solar cells as the surface passivation layers, achieving a conversion efficiency of 19.06% on a large size (156 mm×156 mm) solar cell.