“…The synthesis of nano- and mesoporous thin films for antireflective (AR) coatings has gained considerable interest because they have been widely applied on many devices such as eyeware, solar cells, and lasers. − Substrates with higher light transmittance can be prepared by depositing AR coatings, which would exhibit the destructive interference between light reflected from the coating/substrate and air/coating interfaces. , A good AR coating exhibited low refractive index and coating thickness of one-quarter of the visible wavelength, which is about 80–160 nm. − Nano- and mesoporous films for AR coatings can be fabricated through a number of approaches including sol–gel process, chemical/plasma etching, chemical vapor deposition, and layer-by-layer (LbL) assembly. ,,− The sol–gel process, which involves hydrolyzation and condensation of inorganic salts or metal alkoxides to form oxide materials, is one of the most prevalent technologies to fabricate AR coatings via mainly the dip or spin coating process. ,, Creating subwavelength structures on surface by using chemical/plasma etching or chemical vapor deposition can suppress the surface reflection and consequently results in the substrate exhibiting excellent AR performance. ,,,, LbL assembly technique is a simple, inexpensive, and environmentally benign approach to fabricate AR coatings as compared with other approaches. It is a versatile approach to fabricate uniform, conformal coatings with tunable composition, thickness, and structure by varying coating materials and solution conditions. ,,, …”