2001
DOI: 10.1109/6104.980040
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Application assessment of high throughput flip chip assembly for a high lead-eutectic solder cap interconnect system using no-flow underfill materials

Abstract: Flip chip on board (FCOB) is one of the most quickly growing segments in advanced electronic packaging. In many cases, assembly processes are not capable of providing the high throughputs needed for integrated surface mount technology (SMT) processing [1]. A new high throughput process using no-flow underfill materials has been developed that has the potential to significantly increase flip chip assembly throughput. Previous research has demonstrated the feasibility and reliability of the high throughput proce… Show more

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Cited by 6 publications
(2 citation statements)
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“…Recently, a high-yield process was reported with high I/O density (over 3000 I/O) and fine pitch (down to 150 m) for full area array FCIP interconnect structures comprised of high lead solder bumps with eutectic lead-tin solder interconnects using no-flow underfill [11]- [13]. The reported reflow process conditions were optimized for the high I/O, fine-pitch FCIP assemblies using five different no-flow underfill materials for robust electrical assembly yields.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, a high-yield process was reported with high I/O density (over 3000 I/O) and fine pitch (down to 150 m) for full area array FCIP interconnect structures comprised of high lead solder bumps with eutectic lead-tin solder interconnects using no-flow underfill [11]- [13]. The reported reflow process conditions were optimized for the high I/O, fine-pitch FCIP assemblies using five different no-flow underfill materials for robust electrical assembly yields.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, a full area-array assembly process has been reported, describing a no-flow underfill material for FCIP interconnects that use high-lead solder bumps (Pb/Sn-90/10) and eutectic lead-tin (Pb/Sn-37/63) solder paste; this was used for a flip chip device with high I/O density over 3000 I/O and fine pitch down to 150 m [3]- [5]. The systematic experiments achieved a high-speed assembly process with wide process windows, and the process was validated using a design-of-experiment (DOE) technique, but a large number of voids in the underfill material were observed, and these could cause defects such as solder bridges and solder joint cracks, possibly resulting in early failure under thermal reliability test [6]- [10].…”
mentioning
confidence: 99%