Nuclear Instruments and Methods in Physics Research Section B:
1995
DOI: 10.1016/0168-583x(95)00005-4
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Application of a MeV nickel ion beam for PIXE analysis of iron near the surface of a silicon wafer

Y. Horino
1
,
Yoshiaki Mokuno
2
,
A. Kinomura
3
et al.
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Cited by 2 publications
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