Application of dusty plasma for production of disperse composite materials

Abstract

Objectives and achievements of the production of disperse composite materials (DCMs) which consist of particles with a metal coating are represented. The prospects of the DCM production by the dusty plasma method based on confining a cloud of micron-sized particles in a discharge plasma and on magnetron sputtering are shown. The method was tested in the preparation of catalyst materials, a superhard diamond polycrystalline material, and a polyquasicrystalline material with a low friction coefficient. The results of investigations of the structure and properties of powdered and sintered DCMs are presented.

Determination of microparticle characteristics in an etching plasma

“…Causing defects on the produced semiconductor structures, these particles were unwanted, and the challenge to prevent their formation and presence was born. Advantageous applications of particle‐containing plasmas were identified at a later stage as nanoparticles grown in a plasma can contribute to the production of thin silicon films and can be used for the production of disperse composite materials …”

Влияние условий магнетронного распыления на структуру Zr-Pd покрытий

“…Аморфные материалы этой системы обладают хорошей биосовместимостью [3]. Они могут служить прекурсорами эффективных катализаторов различных химических реакций [4,5]. Высокая твердость, однородность структуры и естественная низкая шероховатость поверхности металлических стекол стимулируют исследования их применимости в качестве антифрикционных материалов [6].…”