Application of Electrothermal Vaporization for Inductively Coupled Plasma Atomic Emission Spectrometry and Inductively Coupled Plasma Mass Spectrometry

Ida, Iwao; Isobe, Ken; Ishibashi, Yohichi; Gunji, Naoki

doi:10.2355/tetsutohagane1955.77.11_1936

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Application of Electrothermal Vaporization for Inductively Coupled Plasma Atomic Emission Spectrometry and Inductively Coupled Plasma Mass Spectrometry

Cited by 4 publications

References 4 publications

Chapter 3 Electrothermal vaporization sample introduction for inductively coupled plasma-mass spectrometry

Chapter 3 Electrothermal vaporization sample introduction for inductively coupled plasma-mass spectrometry

Interferences in inductively coupled plasma mass spectrometry. A review

Electrothermal vaporization–inductively coupled plasma mass spectrometry for the analysis of semiconductor-grade organometallic materials and process chemicals

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